Bulletin of the American Physical Society
73rd Annual Gaseous Electronics Virtual Conference
Volume 65, Number 10
Monday–Friday, October 5–9, 2020; Time Zone: Central Daylight Time, USA.
Session XF3: Plasma Etching
9:45 AM–11:15 AM,
Friday, October 9, 2020
Chair: Wei Tian, Taiwan Semiconductor Manufacturing Corporation
Abstract: XF3.00004 : Dynamics of physicochemical reactions in time-modulation of plasmas for advanced semiconductor processes*
10:45 AM–11:15 AM
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*This work was partly supported by a Grant-in-Aid for Specially Promoted Research (No.19H05462) from the Ministry of Education, Culture, Sports, Science and Technology of Japan.
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