Bulletin of the American Physical Society
72nd Annual Gaseous Electronics Conference
Volume 64, Number 10
Monday–Friday, October 28–November 1 2019; College Station, Texas
Session RR1: Capacitively Coupled Plasmas II |
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Chair: Julian Schulze, Ruhr-University Bochum, Germany Room: Century I |
Thursday, October 31, 2019 4:00PM - 4:30PM |
RR1.00001: Investigation on the plasma uniformity of a capacitively coupled plasma reactor using a two-dimensional GPU-based particle-in-cell simulation Invited Speaker: Hae June Lee A two-dimensional particle-in-cell (PIC) simulation parallelized with graphics processing units (GPU) is a helpful design tool for the computer-aided engineering of the etching and the deposition process. Capacitively coupled plasma (CCP) reactors with the pressure range from 20 mTorr to 10 Torr are simulated for the investigation of the kinetics of electrons and ions. In the pressure range of a few Torr, the spatiotemporal profiles of electron heating and the ion energy distribution functions (IEDFs) on the substrate are sensitively affected by the change of the geometry and the boundary conditions (BCs) of the side wall. The electron Ohmic heating in the radial direction is enhanced near the side wall with a grounded conductor rather than a dielectric wall. Moreover, the change of the IEDF is more sensitive with the dual frequency driving power. In the low-pressure discharges, the effect of high-frequency driving has been investigated with an analytic model of the standing wave effect added to the electron acceleration. The comparison analysis of the local and the nonlocal kinetics is provided based on the results of the PIC simulations at different pressure. [Preview Abstract] |
Thursday, October 31, 2019 4:30PM - 4:45PM |
RR1.00002: A novel large-area sputtering process with tunable coating properties in multi-frequency capacitively coupled plasmas based on the Electrical Asymmetry Effect David Schulenberg, Stefan Ries, Peter Awakowicz, Julian Schulze, Lars Banko, Alfred Ludwig, Daniel Primetzhofer, Marcus Hans, Jochen M. Schneider A large-area multi-frequency capacitively coupled plasma is presented as a novel versatile sputter deposition technique using the electrical asymmetry effect with voltage amplitude adjustment in order to precisely control the ion energy without affecting the ion-to-growth flux ratio. Measurements of the ion energy and ion flux at the substrate with a retarding field energy analyzer combined with the determined deposition rate for an ArN2 plasma at 0.5 Pa show a variation of the mean ion energy within a range that allows the modification of the film characteristics at the grounded electrode, when changing the relative phase shift $\theta $ between the applied voltage frequencies, while the ion-to-growth flux ratio can be kept constant. AlN thin films are deposited and exhibit an increase in compressive film stress, hardness and elastic modulus as well as a change of the preferred orientation as a function of the mean ion energy. [Preview Abstract] |
Thursday, October 31, 2019 4:45PM - 5:00PM |
RR1.00003: Observation of electron series resonance in transversely magnetized 13.56 MHz CCP discharge Jay Joshi, Shikha Binwal, Shantanu Karkari, Sunil Kumar Electron series resonance (ESR) is a condition which is observed in capacitive coupled plasma (CCP) discharges when the usually dominant capacitive reactance of the sheaths and the inductive reactance of the bulk plasma balance each other to present the plasma as a purely resistive electrical load. This is desirable in many circumstances as it is a condition of minimum voltage $ V_{min} $ across the electrodes for a given RF power level and RF matching for the plasma load also becomes simpler. In a conventional parallel plate CCP discharge, for plasma densities in the typical range of $ 10^{16} $ $m^{-3}$, this resonance condition has been reported for a very high frequency of 135.6 MHz. \\In the present work, we report observation of ESR in a transversely magnetized (7.0 mT) parallel plate CCP argon discharge at 13.56 MHz for range of neutral gas pressure (1-5 Pa). A theoretical model to reveal the underlying reason for observing resonance condition at 10 times lower frequency is also presented. The conductivity model obtains a modified resonance condition for a transversely magnetized CCP. Moreover, it also predicts resonance condition for range of neutral gas pressure with RF power (plasma density). [Preview Abstract] |
Thursday, October 31, 2019 5:00PM - 5:15PM |
RR1.00004: Investigation of Variable Excitation Frequency Capacitively Coupled Plasmas at Probing Frequencies up to 3 GHz Andrei Khomenko, Taehwan Seo, Sergey Macheret Tunable capacitors and inductors are key elements of any reconfigurable RF system. Weakly ionized plasma, and particularly CCP, devices are attractive for this because they can handle high power and because their properties can be electronically altered. In this work, we experimentally investigated two symmetric parallel-plate CCP devices: one in air, nitrogen, or argon at a pressure on the order of 1 Torr and with 2 cm gap between the electrodes, and a commercial Gas Discharge Tube (GDT) with 0.6 mm interelectrode gap. We developed a method and a setup that enabled the discharge to be sustained by a variable (10-250 MHz) excitation frequency source, and the real and imaginary parts of the device impedance to be measured at probing frequencies in the range of 300-3000 MHz. The results demonstrate wide tunability of both the magnitude and the sign of the reactance at any probing frequency by changing the excitation frequency and/or power. [Preview Abstract] |
Thursday, October 31, 2019 5:15PM - 5:30PM |
RR1.00005: Study the excitation of high frequency waves and its effect on plasma properties in weakly magnetized capacitive discharge Sarvesh Sharma, Shali Yang, Alexander V. Khrabrov, Igor Kaganovich, Wei Jiang In recent publication [Phys. Plasmas 25, 080704 (2018)] it is reported that the spatial symmetry in low pressure single frequency capacitively coupled plasmas (SF-CCP) can be break by using transverse magnetic field. It is also shown that the flux and energy of ions can be controlled simultaneously by changing the sheath width with help of transverse magnetic field. In present work, we report the numerical evidence of the excitation of the high frequency waves and its effect on electron heating in low-pressure CCP. The detailed study of the effect of these waves on the bulk plasma properties and heating mechanism of electrons and ions are studied here using direct implicit particle in cell (PIC) simulation. [Preview Abstract] |
Thursday, October 31, 2019 5:30PM - 5:45PM |
RR1.00006: Validation Studies using ELK and the Open Source MOOSE Framework Application Zapdos for Electromagnetic Coupled Plasma Simulation Casey Icenhour, Corey DeChant, Alexander Lindsay, Richard Martineau, David Green, Steven Shannon An open source simulation platform that captures electromagnetics, plasma chemistry, and fluid treatment of the plasma domain would be a powerful tool for studying low temperature plasma (LTP) phenomena. Within the Multiphysics Object-Oriented Simulation Environment (MOOSE) open source framework, ELK, CRANE, and Zapdos are combined to provide open source simulation capability for the LTP community. This talk presents continued validation of the general electromagnetic (EM) simulation tool ELK (Electromagnetic Library for Kinetics \& fluids). Previous validation efforts focused on simulating standard waveguide and antenna benchmarks in vacuum and linear dielectrics, but ELK has since been coupled with the MOOSE-based plasma fluid application Zapdos [Lindsay et al 2016 J. Phys. D: Appl. Phys. \textbf{49} 235204] to perform radio-frequency (rf) capacitively coupled plasma (CCP) system simulation. Plasma validation efforts initially focused on electrostatic benchmarks to demonstrate ELK-Zapdos code coupling and then moved to electromagnetic benchmarks based on interesting geometries and conditions (VHF effects in a CCP reactor, microwave heating, etc.). Results and progress in these efforts will be summarized and discussed. [Preview Abstract] |
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