68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015;
Honolulu, Hawaii
Session Index
Session SF2: Carbon Related Materials Deposition
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Show Abstracts |
Chair: Jyh-Ming Ting, National Cheng Kung University
Room: 308 AB
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Friday, October 16, 2015
8:00AM - 8:15AM
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SF2.00001: Effects of Fluorine Termination of Carbon Nanowall Edges on Their Electrical Properties by Ar/NO/F$_{2}$ Mixture Gas Treatments
Hyung Jun Cho, Satomi Tajima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masaru Hori
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Friday, October 16, 2015
8:15AM - 8:30AM
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SF2.00002: Colorful carbon nanopopcorns formed by plasma CVD of diamond-like carbon from CH4 and co-deposited C60 followed by reaction with water vapor
Toshihiro Shimada, Wei Xie, Takuya Miura, Takashi Yanase, Taro Nagahama
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Friday, October 16, 2015
8:30AM - 8:45AM
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SF2.00003: Fabrication of Nanoplatform Based on Vertical Nanographene
Mineo Hiramatsu, Masakazu Tomatsu, Hiroki Kondo, Masaru Hori
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Friday, October 16, 2015
8:45AM - 9:00AM
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SF2.00004: Effect of atomic composition on hardness of Si-containing a-C:H films deposited by ultra-high-speed PECVD at over 100 micron/h
Hiroyuki Kousaka, Yasuyuki Takaoka, Noritsugu Umehara
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Friday, October 16, 2015
9:00AM - 9:15AM
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SF2.00005: Single-crystal diamond growth with sub-millisecond-pulsed discharge of microwave plasma
Hideaki Yamada, Akiyoshi Chayahara, Yoshiaki Mokuno
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