Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session NR2: Plasma CVD/Radical Assisted CVD
8:00 AM–9:30 AM,
Thursday, October 15, 2015
Room: 308 AB
Chair: Kazunori Koga, Kyushu University
Abstract ID: BAPS.2015.GEC.NR2.2
Abstract: NR2.00002 : Study of O$_{3}$-TEOS SiO$_{2}$ Cladding for Silicon Photonics Devices
8:15 AM–8:30 AM
Preview Abstract Abstract
Authors:
Keizo Kinoshita
(PETRA)
Tsuyoshi Horikawa
(PETRA, AIST)
Daisuke Shimura
(PETRA)
Hiroyuki Takahashi
(PETRA)
Tohru Mogami
(PETRA)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.NR2.2
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