68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015;
Honolulu, Hawaii
Session Index
Session IW2: Ion Assisted Deposition
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Show Abstracts |
Chair: Mineo Hiramatsu, Meijo University
Room: 308 AB
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Wednesday, October 14, 2015
8:00AM - 8:15AM
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IW2.00001: Superhard Coatings Synthesis Assisted by Pulsed Beams of High-Energy Gas Molecules
Alexander Metel, Vasily Bolbukov, Marina Volosova, Sergei Grigoriev, Yury Melnik
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Wednesday, October 14, 2015
8:15AM - 8:30AM
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IW2.00002: Effects of ion bombardments on electronic properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition
Hirotsugu Sugiura, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Masaru Hori
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Wednesday, October 14, 2015
8:30AM - 8:45AM
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IW2.00003: In-situ monitoring of plasma ion assisted deposition (PIAD) processes
Jens Harhausen, R\"udiger Foest, Detlef Loffhagen
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Wednesday, October 14, 2015
8:45AM - 9:00AM
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IW2.00004: ICP-Enhanced Sputter Deposition for Reactivity Control and Low-Temperature Formation of a-IGZO Films
Yuichi Setsuhara, Keitaro Nakata, Yoshikatsu Satake, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
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Wednesday, October 14, 2015
9:00AM - 9:15AM
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IW2.00005: Plasma deposition of amorphous silicon carbide thin films irradiated with neutrons
J. Huran, P. Bohacek, M. Kucera, A. Kleinova, V. Sasinkova
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Wednesday, October 14, 2015
9:15AM - 9:30AM
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IW2.00006: Feature Scale Simulations of Deposition Processes
Paul Moroz, Daniel J. Moroz
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