Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session GT1: Poster Session I (4:00pm - 6:00 pm)
4:00 PM,
Tuesday, October 13, 2015
Room: Exhibit Hall III
Abstract ID: BAPS.2015.GEC.GT1.141
Abstract: GT1.00141 : Formation of hydrogenated amorphous carbon films by reactive high power impulse magnetron sputtering containing C$_2$H$_2$ gas*
Preview Abstract
Abstract
Authors:
Takashi Kimura
(Nagoya Institute of Technology)
Hikaru Kamata
(Nagoya Institute of Technology)
*This work is partially supported by JSPS KAKENHI Grant Number 26420230.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.GT1.141
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700