Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session FT4: Thermal Plasmas; Materials Applications
1:30 PM–3:30 PM,
Tuesday, October 13, 2015
Room: 303 AB
Chair: Masaya Shigeta, Osaka University
Abstract ID: BAPS.2015.GEC.FT4.2
Abstract: FT4.00002 : Fundamental of a Planar Type of Inductively Coupled Thermal Plasma (ICTP) on a Substrate for a Large-area Materials Processings
2:00 PM–2:15 PM
Preview Abstract Abstract
Authors:
MaiKai SuanTial
(Kanazawa University)
Mika Akao
(Kanazawa University)
Hiromitsu Irie
(Kanazawa University)
Yuji Maruyama
(Kanazawa University)
Yasunori Tanaka
(Kanazawa University)
Yoshihiko Uesugi
(Kanazawa University)
Tatsuo Ishijima
(Kanazawa University)
Collaboration:
Kanazawa University
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.FT4.2
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