68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015;
Honolulu, Hawaii
Session Index
Session FT4: Thermal Plasmas; Materials Applications
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Show Abstracts |
Chair: Masaya Shigeta, Osaka University
Room: 303 AB
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Tuesday, October 13, 2015
1:30PM - 2:00PM
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FT4.00001: Thermal Plasmas: Influence of Current Modulation on Process Performance
Invited Speaker:
Jochen Schein
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Tuesday, October 13, 2015
2:00PM - 2:15PM
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FT4.00002: Fundamental of a Planar Type of Inductively Coupled Thermal Plasma (ICTP) on a Substrate for a Large-area Materials Processings
MaiKai SuanTial, Mika Akao, Hiromitsu Irie, Yuji Maruyama, Yasunori Tanaka, Yoshihiko Uesugi, Tatsuo Ishijima
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Tuesday, October 13, 2015
2:15PM - 2:30PM
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FT4.00003: Potential Alternatives for Advanced Energy Material Processing in High Performance Li-ion Batteries (LIBs) via Atmospheric Pressure Plasma Treatment
Jenq-Gong Duh, Shang-I Chuang, Chun-Kai Lan, Hao Yang, Hsien-Wei Chen
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Tuesday, October 13, 2015
2:30PM - 2:45PM
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FT4.00004: Investigation on evaporation of Ti feedstock and formation of precursor TiO molecules during TiO$_{2}$ nanopowder synthesis in induction thermal plasma with time-controlled feedstock injection
Naoto Kodama, Kentaro Kita, Yosuke Ishisaka, Yasunori Tanaka, Yoshihiko Uesugi, Tatsuo Ishijima, Shiori Sueyasu, Keitaro Nakamura
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Tuesday, October 13, 2015
2:45PM - 3:00PM
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FT4.00005: Time-dependent areal mass density for disc-shaped substrates in a corona-activated flow stream at atmospheric pressure for argon/acetylene admixture
Shuzheng Xie, Rokibul Islam, Bashir Hussein, Karl Englund, Patrick Pedrow
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Tuesday, October 13, 2015
3:00PM - 3:15PM
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FT4.00006: Nitrogen-Doped Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Composite Films/p-Silicon heterojunction
Tsuyoshi Yoshitake, Abdelrahman Zkria
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Tuesday, October 13, 2015
3:15PM - 3:30PM
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FT4.00007: Ablation and deposition processes in carbon arc discharge for nanosynthesis
Yevgeny Raitses, Jonathan Ng, Valerian Nemchinsky, Yao-Wen Yeh, Sophia Gershman, Vlad Vekselman
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