Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session DT2: Plasma Surface Interactions I
8:00 AM–9:45 AM,
Tuesday, October 13, 2015
Room: 308 AB
Chair: Toshihiko Iwao, Tokyo Electron, Inc.
Abstract ID: BAPS.2015.GEC.DT2.5
Abstract: DT2.00005 : Mechanisms of Hydrocarbon Based Polymer Etch
9:15 AM–9:30 AM
Preview Abstract Abstract
Authors:
Barton Lane
(Tokyo Electron America)
Peter Ventzek
(Tokyo Electron America)
Masaaki Matsukuma
(TEL Technology Development Center, Yamanashi)
Ayuta Suzuki
(TEL Technology Development Center, Yamanashi)
Akira Koshiishi
(TEL Process Module Technology Department, Miyagi)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.DT2.5
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