Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session ET2: Capacitively Coupled Plasmas I
10:00 AM–12:15 PM,
Tuesday, October 13, 2015
Room: 308 AB
Chair: Pascal Chabert, Ecole Polytechnique
Abstract ID: BAPS.2015.GEC.ET2.4
Abstract: ET2.00003 : Control of electron heating dynamics and DC self bias in electronegative capacitive CF$_{4}$ plasmas by voltage waveform tailoring
10:45 AM–11:00 AM
Preview Abstract Abstract
Authors:
Julian Schulze
(West Virginia University)
Bastien Bruneau
(Ecole Polytechnique)
Erik Johnson
(Ecole Polytechnique)
Jean-Paul Booth
(Ecole Polytechnique)
Trevor Lafleur
(Ecole Polytechnique)
Ihor Korolov
(Hungarian Academy of Sciences)
Aranka Derzsi
(Hungarian Academy of Sciences)
Zoltan Donko
(Hungarian Academy of Sciences)
Steven Brandt
(West Virginia University)
Edmund Schuengel
(West Virginia University)
Arthur Greb
(York Plasma Institute)
Deborah O'Connell
(York Plasma Institute)
Timo Gans
(York Plasma Institute)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.ET2.4
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