Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session ET2: Capacitively Coupled Plasmas I
10:00 AM–12:15 PM,
Tuesday, October 13, 2015
Room: 308 AB
Chair: Pascal Chabert, Ecole Polytechnique
Abstract ID: BAPS.2015.GEC.ET2.1
Abstract: ET2.00001 : Gaining greater control and understanding of processing plasmas through Tailored Voltage Waveforms
10:00 AM–10:30 AM
Preview Abstract Abstract
Author:
Erik Johnson
(LPICM-CNRS, Ecole Polytechnique)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.ET2.1
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