65th Annual Gaseous Electronics Conference
Volume 57, Number 8
Monday–Friday, October 22–26, 2012;
Austin, Texas
Session Index
Session ET1: Nanotechnologies I
Chair: Makoto Kambara, University of Tokyo
Room: Amphitheatre 204
Tuesday, October 23, 2012
1:30PM - 2:00PM
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ET1.00001: Three-Dimensional Integrated Micro Solution Plasmas for Nano Materials Processing
Invited Speaker:
Tatsuru Shirafuji
Preview Abstract |
Tuesday, October 23, 2012
2:00PM - 2:15PM
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ET1.00002: Microplasma-liquid interactions for nanomaterials synthesis
Jenish Patel, Paul Maguire, Davide Mariotti
Preview Abstract |
Tuesday, October 23, 2012
2:15PM - 2:30PM
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ET1.00003: Diamondoid synthesis by nanosecond pulsed microplasmas generated in He at atmospheric pressure
Sven Stauss, Tomoki Shizuno, Fumito Oshima, David Z. Pai, Kazuo Terashima
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Tuesday, October 23, 2012
2:30PM - 2:45PM
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ET1.00004: Generation of plasmas in supercritical xenon inside microcapillaries for synthesis of diamondoid
Fumito Oshima, Chikako Ishii, Sven Stauss, Kazuo Terashima
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Session ET2: Atmospheric Pressure Nanosecond Pulsed Discharges
Chair: Anne Bourdon, Ecole Centrale Paris - CNRS
Room: Classroom 203
Tuesday, October 23, 2012
1:30PM - 1:45PM
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ET2.00001: Numerical Simulation of a Nanosecond-Pulse Discharge for High-Speed Flow Control
Jonathan Poggie, Igor Adamovich
Preview Abstract |
Tuesday, October 23, 2012
1:45PM - 2:00PM
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ET2.00002: Laser Thomson Scattering Diagnostics of Pulsed Filamentary Discharge Plasmas
Nima Bolouki
Preview Abstract |
Tuesday, October 23, 2012
2:00PM - 2:15PM
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ET2.00003: High Speed Switching Micoplasma in High Pressure Gases
Dani Wakim, David Staack
Preview Abstract |
Tuesday, October 23, 2012
2:15PM - 2:30PM
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ET2.00004: Design and characterization of a plasma actuator for controlling dynamic stall
William Pollard, David Staack
Preview Abstract |
Tuesday, October 23, 2012
2:30PM - 3:00PM
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ET2.00005: Aerospace applications of pulsed plasmas
Invited Speaker:
Andrey Starikovskiy
Preview Abstract |
Session ET3: Inductively Coupled Plasmas
Chair: Steve Shannon, North Carolina State University
Room: Classroom 202
Tuesday, October 23, 2012
1:30PM - 2:00PM
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ET3.00001: Ferromagnetic Enhanced Inductive Plasma Sources
Invited Speaker:
Valery Godyak
Preview Abstract |
Tuesday, October 23, 2012
2:00PM - 2:15PM
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ET3.00002: High Pressure Discharge Negative Ion Source
Lynn Olson, John Blandino, Nikolaos Gatsonis
Preview Abstract |
Tuesday, October 23, 2012
2:15PM - 2:30PM
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ET3.00003: Three-Dimensional Electromagnetic Plasma Modeling of Inductively Coupled Plasma Source and Antenna
Shahid Rauf, Ankur Agarwal, Jason Kenney, Ming-Feng Wu, Ken Collins
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Tuesday, October 23, 2012
2:30PM - 2:45PM
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ET3.00004: Evidence of weak plasma series resonance heating in the H-mode of neon and neon/argon inductively coupled plasmas
A.E. Wendt, John B. Boffard, R.O. Jung, Chun C. Lin, L.E. Aneskavich
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Tuesday, October 23, 2012
2:45PM - 3:00PM
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ET3.00005: Model of an Ar/O$_{2}$ inductive discharge used for plasma spray deposition
Claudia Lazzaroni, Mehrdad Nikravech, Pascal Chabert
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Session ET4: Ion Distribution Functions
Chair: Svetlana Radovanov, Varian Semiconductor Equipment Associates, Inc
Room: Salon DE
Tuesday, October 23, 2012
1:30PM - 1:45PM
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ET4.00001: 2D ion velocity distribution function measurements by laser-induced fluorescence above a radio-frequency biased silicon wafer
Nathaniel Moore, Walter Gekelman, Patrick Pribyl, Yiting Zhang, Mark Kushner
Preview Abstract |
Tuesday, October 23, 2012
1:45PM - 2:00PM
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ET4.00002: Space and Phase Resolved Modeling of Ion Energy Angular-Distributions from the Bulk Plasma to the Wafer in Dual Frequency Capacitively Coupled Plasmas
Yiting Zhang, Nathaniel Moore, Patrick Pribyl, Walter Gekelman, Mark J. Kushner
Preview Abstract |
Tuesday, October 23, 2012
2:00PM - 2:15PM
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ET4.00003: Ion energy distributions at the electrodes of high pressure capacitive dual-frequency hydrogen discharges
Edmund Sch\"ungel, Sebastian Mohr, Julian Schulze, Uwe Czarnetzki
Preview Abstract |
Tuesday, October 23, 2012
2:15PM - 2:45PM
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ET4.00004: High Energy IED measurements with MEMs based Si grid technology inside a 300mm Si wafer
Invited Speaker:
Merritt Funk
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Tuesday, October 23, 2012
2:45PM - 3:00PM
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ET4.00005: Single and multi-point ion energy distributions in a VHF+RF commercial plasma reactor measured by novel in-wafer ion energy analyzer
Barton Lane, Merritt Funk, Lee Chen, Radha Sundararajan, Jianping Zhao
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