Bulletin of the American Physical Society

63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas

Volume 55, Number 7

Monday–Friday, October 4–8, 2010; Paris, France

Session Index

Session VF1: Capacitively-Coupled Plasmas

Chair: Miles Turner, Dublin City University
Room: 151

Friday, October 8, 2010 4:00PM - 4:30PM		VF1.00001: Progress on simulations of multiple-frequency capacitively coupled discharges Invited Speaker: Preview Abstract
Friday, October 8, 2010 4:30PM - 4:45PM		VF1.00002: Two-dimensional hybrid simulation of capacitively coupled plasmas with two rf sources Yuan-Hong Song, Xiang Xu, Zhen-Hua Bi, Yu-Ru Zhang, You-Nian Wang Preview Abstract
Friday, October 8, 2010 4:45PM - 5:00PM		VF1.00003: The Electrical Asymmetry Effect in multi-frequency capacitively coupled radio frequency discharges Julian Schulze, Zoltan Donko, Edmund Schuengel, Uwe Czarnetzki Preview Abstract
Friday, October 8, 2010 5:00PM - 5:30PM		VF1.00004: Electrode Impedance Effect in a CCP reactor Invited Speaker: Preview Abstract
Friday, October 8, 2010 5:30PM - 5:45PM		VF1.00005: Effects of rf phase control in VHF-CCP system Yeonghun Han, Chul-ho Shin, Sang-min Jeong, Dougyong Sung Preview Abstract
Friday, October 8, 2010 5:45PM - 6:00PM		VF1.00006: Confinement effect due to standing wave in VHF driven CCP Seok-Hwan Lee, Myung-Sun Choi, Gon-Ho Kim Preview Abstract

Session VF2: Plasma Deposition III

Chair: Masaharu Shiratani, Kyushu University
Room: Petit Amphitheatre

Friday, October 8, 2010 4:00PM - 4:30PM		VF2.00001: Purified Si Film Formation from Metallurgical-Grade Si by Hydrogen Plasma Induced Chemical Transport Invited Speaker: Preview Abstract
Friday, October 8, 2010 4:30PM - 4:45PM		VF2.00002: Surface chemistry of the preferred (111) and (220) crystal oriented microcrystalline Si films by radio-frequency plasma-enhanced chemical vapor deposition Hajime Shirai, Daisuke Ohba, Zeguo Tang, Chien-Hui Lai Preview Abstract
Friday, October 8, 2010 4:45PM - 5:00PM		VF2.00003: How much water we have in silane-oxygen plasma during SiO2 deposition in HDP-PECVD reactor Pavel Bulkin, Tatiana Novikova, Dmitri Daineka, Roelene Botha Preview Abstract
Friday, October 8, 2010 5:00PM - 5:15PM		VF2.00004: Plasma induced chemistry of self-assembled nanoparticles and underlying surface for High-k film growth Takeshi Kitajima, Toshiki Nakano Preview Abstract
Friday, October 8, 2010 5:15PM - 5:30PM		VF2.00005: Plasma synthesis of silicon nanocrystals as a new route for large area electronic applications Pere Roca i Cabarrocas, Alexey Abramov, Ka-Hyun Kim, Erik V. Johnson Preview Abstract
Friday, October 8, 2010 5:30PM - 5:45PM		VF2.00006: Cold atmospheric pressure plasma polymerization of hexamethyldisiloxane for improved wood plastics composites Patrick Pedrow, William Lekobou, Erik Wemlinger, Karl Englund, Marie-Pierre Laborie Preview Abstract
Friday, October 8, 2010 5:45PM - 6:00PM		VF2.00007: HMDSO / O$_{2}$ atmospheric pressure plasma chemistry leading to SiO$_{2}$ film synthesis Ruediger Reuter, Dirk Ellerweg, Jan Benedikt, Achim von Keudell Preview Abstract

Session VF3: Dusty Plasmas II

Chair: Laifa Boufendi, GREMI, CNRS-Universite d'Orleans
Room: 262

Friday, October 8, 2010 4:00PM - 4:15PM		VF3.00001: The effect of discharge frequency on the charge of dust particles T. Antonova, S.A. Khrapak, C.-R. Du, B. Steffes, H.M. Thomas, G.E. Morfill Preview Abstract
Friday, October 8, 2010 4:15PM - 4:30PM		VF3.00002: The energy distribution of ions impinging on nanoparticles in collisional plasmas Federico Galli, Meenakshi Manunuru, Uwe Kortshagen Preview Abstract
Friday, October 8, 2010 4:30PM - 4:45PM		VF3.00003: Thermal creep flux in a complex plasma Mierk Schwabe, Sergey Zhdanov, Milenko Rubin-Zuzic, Hubertus Thomas, Gregor Morfill Preview Abstract
Friday, October 8, 2010 4:45PM - 5:15PM		VF3.00004: Behavior of particles in plasma etching apparatus Invited Speaker: Preview Abstract
Friday, October 8, 2010 5:15PM - 5:30PM		VF3.00005: The Spatiotemporal Evolution of an RF Dusty Plasma: Comparison of Numerical Simulations and Experimental Measurements Steven Girshick, Adam Boies, Pulkit Agarwal, Johannes Berndt, Eva Kovacevic, Laifa Boufendi Preview Abstract
Friday, October 8, 2010 5:30PM - 5:45PM		VF3.00006: Dynamics of Ar* metastables atoms in dust free and dusty argon plasmas Ilija Stefanovic, Brankica Sikimic, Nader Sadeghi, Joerg Winter Preview Abstract
Friday, October 8, 2010 5:45PM - 6:00PM		VF3.00007: Nonlinear Oscillations of a Dust Cloud in a rf Plasma Maxime Mikikian, Lenaic Couedel, Marjorie Cavarroc, Yves Tessier, Laifa Boufendi, Olivier Vallee Preview Abstract

Session VF4: Electric Propulsion

Chair: Amnon Fruchtman, Holon Institute of Technology
Room: 162

Friday, October 8, 2010 4:00PM - 4:30PM		VF4.00001: Ion and atom flow in a Hall discharge: Impact of operating parameters Invited Speaker: Preview Abstract
Friday, October 8, 2010 4:30PM - 4:45PM		VF4.00002: Origin of electrons entering the channel of a Closed Electron Drift Thruster (CEDT) Andr\'e Bouchoule, Titaina Gibert Preview Abstract
Friday, October 8, 2010 4:45PM - 5:00PM		VF4.00003: A Monte Carlo Hall Thruster Electron Trajectory Model Michael McDonald, Alec Gallimore, Richard Hofer, Dan Goebel Preview Abstract
Friday, October 8, 2010 5:00PM - 5:15PM		VF4.00004: Two-dimensional particle-in-cell simulation of a Hall thruster for the investigation of the secondary-electron effect In Cheol Song, Hyo-Won Bae, Won Ho Choe, Jongho Seon, Hae June Lee Preview Abstract
Friday, October 8, 2010 5:15PM - 5:30PM		VF4.00005: Direct Emission of a 200W Hall Thruster Plume David Liu, Richard Branam Preview Abstract
Friday, October 8, 2010 5:30PM - 5:45PM		VF4.00006: Diagnostics of a cold gas thruster with electron beams Denis Packan, Jean Bonnet, Paul-Quentin Elias Preview Abstract
Friday, October 8, 2010 5:45PM - 6:00PM		VF4.00007: Axially-propagating millimetric electron density fluctuations in the Hall thruster plasma Sedina Tsikata, Cyrille Honore, Nicolas Lemoine, Dominique Gresillon Preview Abstract

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