Bulletin of the American Physical Society

63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas

Volume 55, Number 7

Monday–Friday, October 4–8, 2010; Paris, France

Session Index

Session QR1: Plasmas in Liquids

Chair: Toshiro Kaneko, Tohoku University
Room: 162

Thursday, October 7, 2010 4:00PM - 4:15PM		QR1.00001: Micro-Plasma Generation in Salt Containing Liquids Lucas Schaper, William G. Graham Preview Abstract
Thursday, October 7, 2010 4:15PM - 4:30PM		QR1.00002: Plasma Production in Liquids: Bubble and Electronic Mechanisms Natalia Yu. Babaeva, Mark J. Kushner Preview Abstract
Thursday, October 7, 2010 4:30PM - 4:45PM		QR1.00003: Nonequilibrium liquid plasma - dynamics of generation and quenching Andrey Starikovskiy, Yong Yang, Young Cho, Alexander Fridman Preview Abstract
Thursday, October 7, 2010 4:45PM - 5:00PM		QR1.00004: Influence of liquid temperature on the characteristics of atmospheric DC glow discharge using liquid electrode with miniature He flow Naoki Shirai, Kosuke Ichinose, Yusuke Hashizume, Satoshi Uchida, Fumiyosyi Tochikubo Preview Abstract
Thursday, October 7, 2010 5:00PM - 5:15PM		QR1.00005: Dynamic Plasma--Liquid Systems and its applications Valeriy Chernyak, Sergej Olszewski, Iryna Prysiazhnevych, Vitaliy Yukhymenko, Dmitry Levko, Anatolij Shchedrin, Andriy Rybatsev, Vadym Naumov Preview Abstract
Thursday, October 7, 2010 5:15PM - 5:30PM		QR1.00006: Influences of Liquid Temperature and Pressure on Microwave-Excited Bubble Plasma Production Tatsuo Ishijima, Kouji Kanetake, Haruka Suzuki, Hirotaka Toyoda Preview Abstract
Thursday, October 7, 2010 5:30PM - 5:45PM		QR1.00007: Selective reactions of reduction and oxidation by bubble supply via electrolysis and successive plasma generation in aqueous solution Osamu Sakai Preview Abstract
Thursday, October 7, 2010 5:45PM - 6:00PM		QR1.00008: Integrated-micro-solution plasma in porous dielectric electrodes and its application to water treatment Tatsuru Shirafuji, Keisuke Asano, Junko Hieda, Nagahiro Saito, Osamu Takai Preview Abstract

Session QR2: Plasma Etching II

Chair: Remi Dussart, Universite d'Orleans
Room: 151

Thursday, October 7, 2010 4:00PM - 4:30PM		QR2.00001: Plasma-surface interactions in plasma etching processes for nanometer-scale microelectronic devices Invited Speaker: Preview Abstract
Thursday, October 7, 2010 4:30PM - 4:45PM		QR2.00002: Simulations of an Ar/HBr/O$_2$ microwave source etch process and the effect of SiBr and SiBr$_2$ cross-sections on computed etch-profiles James Munro, Jonathan Tennyson, Song-Yun Kang, Daniel Brown Preview Abstract
Thursday, October 7, 2010 4:45PM - 5:00PM		QR2.00003: Global Models for Virtual Metrology and Closed Loop Process Control Stephen Daniels, Yang Zhang, Bernard Keville, Evgueni Gudimenko, Chanel Hayden, Anthony Holohan, Miles Turner Preview Abstract
Thursday, October 7, 2010 5:00PM - 5:30PM		QR2.00004: Fine ion energy control for sub-32 nm node device RIE using pulsed-DC superimposed 100 MHz rf CCP Invited Speaker: Preview Abstract
Thursday, October 7, 2010 5:30PM - 5:45PM		QR2.00005: Modification of Si-O-Si Structure in Porous SiOCH Low-$k$ Films with Ions, Radicals, and VUV Radiation in O$_{2}$ Plasma Hiroshi Yamamoto, Kohei Asano, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori Preview Abstract
Thursday, October 7, 2010 5:45PM - 6:00PM		QR2.00006: Study of a Charging Voltage during SiO$_{2}$ Etching in a 2f-CCP Takashi Yagisawa, Tetsuya Tatsumi, Toshiaki Makabe Preview Abstract

Session QR3: Collision Processes in Plasmas

Chair: Thomas Miller, Boston College
Room: Petit Amphitheatre

Thursday, October 7, 2010 4:00PM - 4:30PM		QR3.00001: Collision induced water fragmentation: multiple ionisation and isotopic effects Invited Speaker: Preview Abstract
Thursday, October 7, 2010 4:30PM - 4:45PM		QR3.00002: Quantum-mechanical capture and ionization calculations for ion-water-molecule collisions Tom Kirchner, Hans Juergen Luedde, Mitsuko Korobkin, Marko Horbatsch Preview Abstract
Thursday, October 7, 2010 4:45PM - 5:15PM		QR3.00003: Teaching an old dog new tricks: Using the Flowing Afterglow Langmuir Probe apparatus to measure electron attachment to radicals and ion-ion neutralization Invited Speaker: Preview Abstract
Thursday, October 7, 2010 5:15PM - 5:30PM		QR3.00004: Collisional dissociative recombination of H$_{3}^{+}$ ions with electrons Rainer Johnsen Preview Abstract
Thursday, October 7, 2010 5:30PM - 5:45PM		QR3.00005: Small Molecule Processes in ITER J. Brian A. Mitchell, Sophie Carles, Jean-Luc LeGarrec Preview Abstract
Thursday, October 7, 2010 5:45PM - 6:00PM		QR3.00006: Low energy elastic electron scattering from furan Murtadha A. Khakoo, John Muse, Kevin Ralphs, Romarly F. da Costa, Marcio H.F. Bettega, Marco A.P. Lima Preview Abstract

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Bulletin of the American Physical Society

63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas

Volume 55, Number 7

Monday–Friday, October 4–8, 2010; Paris, France

Session Index

Session QR1: Plasmas in Liquids

Session QR2: Plasma Etching II

Session QR3: Collision Processes in Plasmas

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