Tuesday, October 5, 2010
4:00PM - 4:30PM
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ET1.00001: Experimental and computational characterization of He+H$_2$O plasmas at atmospheric pressure
Invited Speaker:
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Tuesday, October 5, 2010
4:30PM - 4:45PM
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ET1.00002: Characterisation of a He/O$_2$/HMDSO microplasma jet by molecular beam mass spectrometry
Dirk Ellerweg, Ruediger Reuter, Jan Benedikt, Achim von Keudell
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Tuesday, October 5, 2010
4:45PM - 5:00PM
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ET1.00003: Ignition Delay Time and OH Concentration Measurements in Nanosecond Repetitively Pulsed Hydrogen-Air Plasmas
Igor Adamovich, Zhiyao Yin, Inchul Choi, Walter Lempert
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Tuesday, October 5, 2010
5:00PM - 5:15PM
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ET1.00004: Generation and Control of Atmospheric-pressure Glow Microdischarges along Miniature Water Flow
Makoto Kanemaru, Nao Tatsumura, Shinji Ibuka, Shozo Ishii
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Tuesday, October 5, 2010
5:15PM - 5:30PM
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ET1.00005: The role of negative ions in the formation of filamentary efficient plasma in air at atmospheric pressure
Emmanuel Marode
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Tuesday, October 5, 2010
5:30PM - 5:45PM
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ET1.00006: Non-thermal plasma synthesis of H$_{2}$O$_{2}$: investigation of DBD and surface-DBD performances
Frederic Thevenet, Julien Couble, Markus Brandhorst, Jean-Luc Dubois, Daniel Bianchi
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Tuesday, October 5, 2010
5:45PM - 6:00PM
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ET1.00007: Chemical kinetics in a helium humid air atmospheric pressure plasma
Tomoyuki Murakami, Timo Gans, Deborah O'Connell, W.G. Graham
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Tuesday, October 5, 2010
4:00PM - 4:15PM
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ET2.00001: Model of the dynamics of the self-pulsing regime in a micro hollow cathode discharge in argon
Claudia Lazzaroni, Pascal Chabert, Antoine Rousseau
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Tuesday, October 5, 2010
4:15PM - 4:30PM
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ET2.00002: Micro Hollow Cathode Discharge Arrays in silicon devices
Remi Dussart, Mukesh Kulsreshath, Lawrence Overzet, Laurent Schwaederle, Thomas Tillocher, Julien Ladroue, Olivier Aubry, Philippe Lefaucheux, Matthew Goeckner, Pierre Ranson
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Tuesday, October 5, 2010
4:30PM - 4:45PM
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ET2.00003: Breakdown Phase of Pulsed N$_{2}$/He Atmospheric-pressure Micro-hollow Cathode Discharge Plasma
Toshiki Nakano, Shinya Wake, Takeshi Kitajima
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Tuesday, October 5, 2010
4:45PM - 5:00PM
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ET2.00004: VUV light source based on Cl-atom emission produced by a microdischarge
Virginie Martin, Gerard Bauville, Vincent Puech
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Tuesday, October 5, 2010
5:00PM - 5:15PM
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ET2.00005: Scaling microplasma arrays for material processing
Chen Wu, Naoto Miura, Jun Xue, Michael Grunde, Kevin Morrissey, Jeffrey Hopwood
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Tuesday, October 5, 2010
5:15PM - 5:30PM
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ET2.00006: MIP source for analytical applications: experimental and simulation study
Margarita Baeva, Andre B\"{o}sel, J\"{o}rg Ehlbeck, Detlef Loffhagen
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Tuesday, October 5, 2010
5:30PM - 5:45PM
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ET2.00007: Microwave micro-discharges at atmospheric pressure: experiments and simulations
J. Greg\'orio, O. Leroy, P. Leprince, C. Boisse-Laporte, L.L. Alves
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Tuesday, October 5, 2010
5:45PM - 6:00PM
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ET2.00008: Conversion of Organic Compounds by Pulsed Discharge Plasma in Sub- and Supercritical Fluids
Motonobu Goto, Mitsuru Sasaki, Diono Wahyu, Koichi Nagafuchi, Hiroshi Watanabe, Tsuyoshi Kiyan, Takao Namihira, Hidenori Akiyama
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Tuesday, October 5, 2010
4:00PM - 4:15PM
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ET3.00001: Density of copper atoms in the ground and metastable states in an argon magnetron discharge correlated to the Cu deposition rate
Nader Sadeghi, Hamid Naghshara, Sirous Khorram, Samad Sobhanian
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Tuesday, October 5, 2010
4:15PM - 4:30PM
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ET3.00002: TiO$_{2}$/Polyaniline nanocomposite films prepared by modified plasma polymerization process
Joyanti Chutia, Arup Ratan Pal, Bimal Kumar Sarma
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Tuesday, October 5, 2010
4:30PM - 4:45PM
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ET3.00003: Atmospheric pressure plasma liquid deposition of Cu nanoparticles onto P4VP-grafted-PTFE surface and their autocatalytic characteristics
Nobuyuki Zettsu, Hiroki Akiyama, Kazuya Yamamura
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Tuesday, October 5, 2010
4:45PM - 5:00PM
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ET3.00004: Formation of Highly-Ordered Nanoparticle Structure Using Controlled Gas-Liquid Interfacial Plasmas
Toshiro Kaneko, Takashi Harada, Rikizo Hatakeyama
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Tuesday, October 5, 2010
5:00PM - 5:15PM
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ET3.00005: Effect of dual HiPIMS discharge parameters on formation and crystallography of antimicrobial Ti-Cu films
Rainer Hippler, Vitezslav Stranak, Harm Wulff, Robert Bogdanowicz, Zdenek Hubicka, Carmen Zietz, Rainer Bader
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Tuesday, October 5, 2010
5:15PM - 5:30PM
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ET3.00006: Deposition of a-C:H:N plasma polymer thin films for the functionalization of textiles
Sebastien Guimond, Dirk Hegemann
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Tuesday, October 5, 2010
5:30PM - 5:45PM
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ET3.00007: Internal DLC Coating of Narrow Metal Tubes with High-Density Near Plasma Sustained by Microwave Propagation along Plasma-Sheath Interfaces
Hiroyuki Kousaka
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Tuesday, October 5, 2010
5:45PM - 6:00PM
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ET3.00008: Deep Silicon Trench Oxidation in Downstream of Surface-wave Oxygen Plasma
Haruo Shindo, Jyun Koike, Yuuto Igarashi
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Tuesday, October 5, 2010
4:00PM - 4:30PM
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ET4.00001: Blood-biocompatible materials via plasma processing
Invited Speaker:
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Tuesday, October 5, 2010
4:30PM - 4:45PM
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ET4.00002: Novel Plasma Surface Texturing of Metals for Biomedical Applications
Eunsung Park
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Tuesday, October 5, 2010
4:45PM - 5:00PM
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ET4.00003: Development of an Air Plasma Driven by Energy Controlled DC Pulse
Chang-Seung Ha, Dong-Hyun Kim, Hae June Lee, Ho-Jun Lee, Sang Rye Park, Gyoo Cheon Kim
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Tuesday, October 5, 2010
5:00PM - 5:15PM
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ET4.00004: A new design of dielectric barrier discharge for self surface sterilization
Yangfang Li, Tetsuji Shimizu, Julia Zimmermann, Gregor Morfill
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Tuesday, October 5, 2010
5:15PM - 5:30PM
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ET4.00005: Reduced-pressure ($\sim $1 torr) argon discharges for sterilization: influence of the type of materials subjected to the discharge
Pierre Levif, Jacynthe Seguin, Michel Moisan, Jean Barbeau
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Tuesday, October 5, 2010
5:30PM - 5:45PM
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ET4.00006: Damages on Bacteria Irradiated by Microwave-excited Atmospheric Pressure Plasmas
Tatsuya Ogawa, Kazuo Takahashi, Takuya Urayama, Shinji Aoki
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Tuesday, October 5, 2010
5:45PM - 6:00PM
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ET4.00007: Effect of Anode-Cathode Gap on Microhollow Cathode Discharges
J. Greenan, C.M.O. Mahony, P.D. Maguire, D. Mariotti
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