Tuesday, October 5, 2010
8:30AM - 9:00AM
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BT1.00001: Synchronized pulsed plasmas: potential process improvements for patterning technologies
Invited Speaker:
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Tuesday, October 5, 2010
9:00AM - 9:15AM
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BT1.00002: Synchronous Plasma Pulsing for Etch Applications
M. Haass, M. Darnon, E. Pargon, S. Banna, O. Joubert
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Tuesday, October 5, 2010
9:15AM - 9:30AM
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BT1.00003: The Etch Step in MEMS Deep Silicon Etch
Iqbal Saraf, Matthew Goeckner, Lawrence Overzet
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Tuesday, October 5, 2010
9:30AM - 9:45AM
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BT1.00004: Dual-RF-Mode Inductively Coupled Plasma (ICP) Source for Advanced Dry Etching Processes
Samer Banna, Ankur Agarwal, Valentin Todorow, Shahid Rauf, Ken Collins
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Tuesday, October 5, 2010
9:45AM - 10:00AM
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BT1.00005: Analysis of gallium nitride (GaN) surface interacted with chlorine etching plasma beams
Shang Chen, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroki Kano, Yutaka Tokuda, Makoto Sekine, Masaru Hori
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Tuesday, October 5, 2010
10:00AM - 10:15AM
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BT1.00006: Deep Gallium Nitride Etching
Julien Ladroue, Mohamed Boufnichel, Thomas Tillocher, Philippe Lefaucheux, Pierre Ranson, R\'emi Dussart
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Tuesday, October 5, 2010
10:15AM - 10:30AM
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BT1.00007: Anisotropic Cl$_{2}$-based ICP etching of III-Vs with the addition of Si-containing gases
L. Gatilova, S. Bouchoule, G. Patriarche, S. Guilet
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Tuesday, October 5, 2010
8:30AM - 9:00AM
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BT2.00001: Nanotextured polymers by plasma etching: defining chemistry and topography for superior wetting and optics
Invited Speaker:
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Tuesday, October 5, 2010
9:00AM - 9:15AM
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BT2.00002: Study of the modifications induced by plasma VUV light on photoresist polymers for the development of plasma cure treatments
Marc Fouchier, Erwine Pargon, Laurent Azarnouche, Olivier Luere, Kevin Menguelti, Gilles Cunge, Nader Sadeghi
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Tuesday, October 5, 2010
9:15AM - 9:30AM
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BT2.00003: In-line plasma cleaning of EUV multilayer mirrors
Evdokim Malykhin, Oleg Braginsky, Alexander Kovalev, Dmitry Lopaev, Alexander Rakhimov, Tatyana Rakhimova, Anna Vasilieva, Sergey Zyryanov, Konstantin Koshelev, Vladimir Krivtsun, Oleg Yakushev
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Tuesday, October 5, 2010
9:30AM - 9:45AM
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BT2.00004: Infrared spectroscopic study on oxidation of carbon for environmental solution
Taka-aki Kawakami, Masanori Shinohara, Kojiro Hara, Yoshinobu Matsuda, Hiroshi Fujiyama, Yuki Nitta, Tatsuyuki Nakatani
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Tuesday, October 5, 2010
9:45AM - 10:00AM
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BT2.00005: Hydrogen/Argon Plasma-Amorphous Carbon Near-Surface Interactions
N. Ning, D.B. Graves, N. Fox-Lyon, G.S. Oehrlein
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Tuesday, October 5, 2010
10:00AM - 10:15AM
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BT2.00006: Studies of Asperity-Scale Plasma Discharge Phenomena
Javan Albright, Laxminarayan Raja, Matthew Manley, K. Ravi-Chandar, Sikhanda Satapathy
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Tuesday, October 5, 2010
10:15AM - 10:30AM
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BT2.00007: Plasma VUV intensity as a function of its electron energy distribution
Lee Chen, Jianping Zhao, Ron Bravenec, Merritt Funk, Radha Sundararajan, Koji Koyama, Toshihisa Nozawa, Seji Samukawa
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Tuesday, October 5, 2010
8:30AM - 9:00AM
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BT4.00001: Low energy electron collisions of relevance to biological radiation damage
Invited Speaker:
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Tuesday, October 5, 2010
9:00AM - 9:30AM
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BT4.00002: Plasma Biomedicine: Modelings and Experiments on Cancer Treatment, Tooth Bleaching, and Decontamination
Invited Speaker:
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Tuesday, October 5, 2010
9:30AM - 9:45AM
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BT4.00003: Hollow Optical Fiber-Based Microplasma for Single Cell-Level Cancer Therapy
Jae Young Kim, John Ballato, Paul Foy, Thomas Hawkins, Yanzhang Wei, Jinhua Li, Sung-O Kim
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Tuesday, October 5, 2010
9:45AM - 10:00AM
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BT4.00004: Control of ROS and RNS in air surface micro-discharge for antisepsis and sterilization
Yukinori Sakiyama, Tetsuji Shimizu, David Graves, Gregor Morfill
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Tuesday, October 5, 2010
10:00AM - 10:15AM
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BT4.00005: Pulsed spark discharge plasma characterization and its biological applications
Danil Dobrynin, Andrey Starikovskiy, Gary Friedman, Alexander Fridman
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Tuesday, October 5, 2010
10:15AM - 10:30AM
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BT4.00006: Prospects of dielectric barrier discharge (DBD) in medical application: Investigation through plasma characterization
P. Rajasekaran, P. Mertmann, N. Bibinov, P. Awakowicz, D. Wandke, W. Vioel
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