Bulletin of the American Physical Society
63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010; Paris, France
Session TF2: Plasma Nanotechnologies and Flexible Electronics II
10:30 AM–12:30 PM,
Friday, October 8, 2010
Room: Petit Amphitheatre
Chair: Tomohiro Nozaki, Tokyo Institute of Technology, Japan
Abstract ID: BAPS.2010.GEC.TF2.4
Abstract: TF2.00004 : Structure Control and Etching Stabilities of Carbon Nanowalls Grown by Low Magnetic-Field Helicon Plasma CVD
11:15 AM–11:30 AM
Preview Abstract Abstract
Authors:
Masahiro Yamazaki
(Department of Electronic Engineering, Tohoku University)
Toshiaki Kato
(Department of Electronic Engineering, Tohoku University)
Ryo Ueda
(NTT-AT Nanofabrication Corporation)
Toshiro Kaneko
(Department of Electronic Engineering, Tohoku University)
Rikizo Hatakeyama
(Department of Electronic Engineering, Tohoku University)
Chiharu Takahashi
(NTT-AT Nanofabrication Corporation)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2010.GEC.TF2.4
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