63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010;
Paris, France
Session Index
Session ET3: Plasma Deposition I
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Show Abstracts |
Chair: Y. Setsuhara, Osaka University
Room: 262
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Tuesday, October 5, 2010
4:00PM - 4:15PM
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ET3.00001: Density of copper atoms in the ground and metastable states in an argon magnetron discharge correlated to the Cu deposition rate
Nader Sadeghi, Hamid Naghshara, Sirous Khorram, Samad Sobhanian
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Tuesday, October 5, 2010
4:15PM - 4:30PM
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ET3.00002: TiO$_{2}$/Polyaniline nanocomposite films prepared by modified plasma polymerization process
Joyanti Chutia, Arup Ratan Pal, Bimal Kumar Sarma
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Tuesday, October 5, 2010
4:30PM - 4:45PM
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ET3.00003: Atmospheric pressure plasma liquid deposition of Cu nanoparticles onto P4VP-grafted-PTFE surface and their autocatalytic characteristics
Nobuyuki Zettsu, Hiroki Akiyama, Kazuya Yamamura
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Tuesday, October 5, 2010
4:45PM - 5:00PM
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ET3.00004: Formation of Highly-Ordered Nanoparticle Structure Using Controlled Gas-Liquid Interfacial Plasmas
Toshiro Kaneko, Takashi Harada, Rikizo Hatakeyama
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Tuesday, October 5, 2010
5:00PM - 5:15PM
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ET3.00005: Effect of dual HiPIMS discharge parameters on formation and crystallography of antimicrobial Ti-Cu films
Rainer Hippler, Vitezslav Stranak, Harm Wulff, Robert Bogdanowicz, Zdenek Hubicka, Carmen Zietz, Rainer Bader
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Tuesday, October 5, 2010
5:15PM - 5:30PM
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ET3.00006: Deposition of a-C:H:N plasma polymer thin films for the functionalization of textiles
Sebastien Guimond, Dirk Hegemann
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Tuesday, October 5, 2010
5:30PM - 5:45PM
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ET3.00007: Internal DLC Coating of Narrow Metal Tubes with High-Density Near Plasma Sustained by Microwave Propagation along Plasma-Sheath Interfaces
Hiroyuki Kousaka
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Tuesday, October 5, 2010
5:45PM - 6:00PM
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ET3.00008: Deep Silicon Trench Oxidation in Downstream of Surface-wave Oxygen Plasma
Haruo Shindo, Jyun Koike, Yuuto Igarashi
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