Bulletin of the American Physical Society
63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010; Paris, France
Session CTP: Poster Session I (11:00-12:30)
11:00 AM,
Tuesday, October 5, 2010
Room: 8 and 251
Abstract ID: BAPS.2010.GEC.CTP.75
Abstract: CTP.00075 : In situ plasma process monitoring of BCl$_3$ using quantum cascade laser absorption spectroscopy
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Abstract
Authors:
Norbert Lang
(Leibniz Institute for Plasma Science and Technology, F.-Hausdorff-Str. 2, 17489 Greifswald, Germany)
J\"urgen R\"opcke
(Leibniz Institute for Plasma Science and Technology, F.-Hausdorff-Str. 2, 17489 Greifswald, Germany)
Frank Hempel
(Leibniz Institute for Plasma Science and Technology, F.-Hausdorff-Str. 2, 17489 Greifswald, Germany)
Siegfried Str\"amke
(ELTRO GmbH, Arnold-Sommerfeld-Ring 3, 52499 Baesweiler, Germany)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2010.GEC.CTP.75
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