The Effect of the Reflectance as a Si-Based Solar Cell Using the Nano-Imprint Lithography Processing*

In this paper, the results of the fabrication of nano-structured Si molds by stepper lithography and dry etching are presented. A nano-imprint system was used to reflectance the mold patterns to a PDMS layer on a Si template using the hot-plate technique. Since this polymeric nano-pattern is smaller than the wavelength of light, the effective refractive index near the surface changes gradually, and reduces the amount of reflection. As a result, the spectra of molds showed significantly reduced reflectance ($<$ 5{\%}) through the entire wavelength range at normal incidence.