Bulletin of the American Physical Society
63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010; Paris, France
Session CTP: Poster Session I (11:00-12:30)
11:00 AM,
Tuesday, October 5, 2010
Room: 8 and 251
Abstract ID: BAPS.2010.GEC.CTP.66
Abstract: CTP.00066 : High resolution measurement of silicon wafer temperature using super-continuum light on optical low-coherence interferometry
Preview Abstract
Abstract
Authors:
Takehiro Hiraoka
(Graduate School of Engineering, Nagoya University)
Chishio Koshimizu
(Yamanashi Technology Development Center, Tokyo Electron AT)
Takayuki Ohta
(Faculty of Systems Engineering, Wakayama University)
Masufumi Ito
(Faculty of Science and Technology, Meijo University)
Norihiko Nishizawa
(Graduate School of Engineering, Nagoya University)
Masaru Hori
(Graduate School of Engineering, Nagoya University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2010.GEC.CTP.66
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