Bulletin of the American Physical Society
62nd Annual Gaseous Electronics Conference
Volume 54, Number 12
Tuesday–Friday, October 20–23, 2009; Saratoga Springs, New York
Session QW: Joint GEC/CNSE Session following CNSE Visit |
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Chair: Eric Joseph, IBM T.J. Watson Research Center Room: College of Nanoscale Science and Engineering NFS Auditorium |
Wednesday, October 21, 2009 7:00PM - 7:25PM |
QW.00001: Plasma synthesis of silicon nanocrystal inks for low-cost photovoltaics Invited Speaker: Silicon is the most widely used material in the microelectronics and photovoltaics industry. Currently it is used in one of two forms: as wafers of single- or polycrystalline material or as CVD deposited thin film material. In this presentation, we discuss an alternate route to forming silicon thin films from solution on flexible substrates. Silicon nanocrystals are formed in a nonthermal plasma. By adding dopant precursors, p- and n-doped as well as intrinsic crystals can be formed. Organic ligands can be attached in the plasma such that nanocrystals become soluble in organic solvents. These ``nanocrystal inks'' can be used to form silicon films with ultra-low-cost printing or coating techniques. Film properties of silicon-ink processed films will be discussed. Proof-of-concept demonstrations of solar cells produced from silicon inks will be presented. [Preview Abstract] |
Wednesday, October 21, 2009 7:25PM - 7:50PM |
QW.00002: Plasma Processing for Advanced Interconnects Invited Speaker: As the critical dimensions of interconnects for advanced semiconductor devices have entered the sub-100nm regime, the interactions of materials with their processing environments have become increasingly important. Modern ultralow-k (ULK) dielectric materials are particularly sensitive to damage caused by exposure to electrons, ions, reactive neutrals and UV radiation during their deposition, patterning, and characterization. This presentation will follow the ``plasma processing life cycle'' of a typical ULK film sample, from deposition through etching and metallization. Particular attention will be paid to damage of the film during etching and the associated structural characterization. Trends of plasma damage with dielectric constant and composition will be described. Finally, the long-term outlook for patterning ULK films to the ``end of the roadmap'' will be discussed. [Preview Abstract] |
Wednesday, October 21, 2009 7:50PM - 8:15PM |
QW.00003: Biomacromolecule immobilization and self-assembled monolayer chemistry on atomic layer deposited metal oxide materials Invited Speaker: Many biotechnology applications involve interfacing proteins, DNA and other macromolecules to non-biological material surfaces acting as supports. Support materials employed for this purpose span the periodic table and range from polymeric membranes/hydrogels to metals and ceramics, for example gold and hydroxyapatite. Lab-on-a-chip and other sensing/detection applications based on lithography and semiconductor technology typically rely on alkanethiol and organosilane chemistry to immobilize biological material to gold and silica. While successful in many instances, organosilane chemistry offers limited options for orthogonal chemistry and often results in multilayer film buildup. Self-assembly on gold is straight forward but gold is often undesirable from a device perspective. Recent developments in atomic layer deposition (ALD) allow fabrication of high quality thin films of alumina and high-k oxide materials that are compatible with clean room operations and are interesting emerging materials for integrated optical, electronic and biological applications. Here we will show alternative self-assembly chemistries on ALD materials for biological immobilization than those used on gold/silica and also demonstrate direct biological interfacing to high-K materials for potential use in bioscreening and detection. [Preview Abstract] |
Wednesday, October 21, 2009 8:15PM - 8:40PM |
QW.00004: Opportunities at the Confluence of Microplasma and Nanomaterials Invited Speaker: More than a decade ago, plasma science ventured into the mesoscopic realm with low temperature, nonequilibrium plasmas confined to cavities having a characteristic dimension (d) below 50 $\mu $m. today, the lower limit for microplasma dimensions is d $\mathbin{\lower.3ex\hbox{$\buildrel\prec\over {\smash{\scriptstyle\sim}\vphantom{_x}}$}} $ 10$\mu $m but experiments in which d approaches 1 $\mu $m are expected in the near future. Several previous microplasma devices have exploited nanomaterials and nanostructures to realize new functionality. This presentation will briefly describe past efforts to integrate microplasmas with nanomaterials and/or nanodevices. A few thoughts regarding exciting opportunities in merging nanoelectronics or nanoptics with $\le $ 1-10 $\mu $m microplasmas will be offered. [Preview Abstract] |
Wednesday, October 21, 2009 8:40PM - 9:05PM |
QW.00005: The CNSE Public-Private Partnership Paradigm: A Driver for New York State and U.S. Educational, Research and Economic Excellence in the 21st Century Invited Speaker: The College of Nanoscale Science and Engineering (CNSE) of the University at Albany-SUNY is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. Envisioned and developed as a bold and unique educational, technological and business paradigm, the CNSE model has produced outcomes that are both significant and unparalleled: preparation of a highly educated, highly skilled workforce that is critical to driving opportunity and growth at all levels; acceleration of nanoscale research and development that is vital to advancing the commercialization of cutting-edge technologies and applications; and, generation of unmatched high-tech investment and job creation that are serving to foster a positive economic and societal impact throughout New York State, while also enhancing national competitiveness in the global innovation economy of the 21$^{st}$ century. In less than a decade of operation, CNSE has become a globally recognized entity. CNSE's Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world: a {\$}5 billion, 800,000-square-foot complex that continuously attracts corporate partners from around the world, offers students a one-of-a-kind academic experience, and educates society on the implications of advances in nanotechnology. CNSE's Albany NanoTech houses the only fully-integrated 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech, with a network of global corporate partners that includes more than 250 leading nanotechnology companies, such as IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, ASML, Applied Materials, Tokyo Electron, Vistec Lithography and Atotech, among many others. [Preview Abstract] |
Wednesday, October 21, 2009 9:05PM - 9:30PM |
QW.00006: Effects of Plasma-Ion Irradiation on Structures and Properties of Carbon Nanotubes Invited Speaker: Nanocarbons of carbon allotropes have drawn great attention due to their high potential for unique properties and a variety of applications. Since carbon nanotubes among them are furnished with one-dimensional hollow inner-nanospaces, various kinds of atoms and molecules are possible to be injected into the nanospaces based on plasma nanotechnology, which could lead to innovative functionalization of the pristine ones. For that purpose original approaches using nanoscopic plasma processing mainly in ionic plasmas have been performed in order to develop SWNT(single-walled carbon nanotube)-, and DWNT(double-walled carbon nanotube)-based materials with novel functions corresponding to nano electronic and biological applications, where positive and negative ions with their energies and fluxes controlled are irradiated to immersed substrates coated with the pristine carbon nanotubes. Consequently, we have innovatively created various kinds of charge-/spin-exploited atoms and molecules encapsulated SWNTs and DWNTs. Finally, their electronic, magnetic, and optical properties are intensively investigated using a configuration of field effect transistor (FET) and a SQUID magnetometer. As a result, we have for the first time realized air-stable semi-conducting pn control, formed nano structures with magnetic semiconductor and ultimate air-stable nano pn-junctions, found distinct characteristics of negative differential resistance, and observed photoinduced electron transfer phenomena upon the encapsulated SWNTs and DWNTs. [Preview Abstract] |
Wednesday, October 21, 2009 9:30PM - 9:55PM |
QW.00007: Leveraging Microelectronics Research to Enable A Smarter Planet Invited Speaker: Over the course of the last fifty years, the microelectronics industry has made tremendous strides in the development and manufacturing of ever more complex integrated circuits (IC). These circuits have typically been applied to the information technology (IT) industry and have driven improvements in the computational power per dollar of many orders of magnitude. Part of the ``toolbox'' of skills acquired to produce integrated circuits is the ability to form desired patterns at ever decreasing sizes. The minimum controllable feature size has been reduced by six orders of magnitude (from millimeters to nanometers) during the last fifty years. With feature sizes rapidly approaching 10nm, the conventional silicon IC industry is nearing a threshold with the end of conventional silicon scaling approaching. Research today focuses on new device structure to replace the CMOS FET as the engine of the IT industry. A very exciting research area today is the concept of taking the skill-set acquired from IC research, development, and manufacturing, and applying those skills into new domains where they can enable a ``smarter planet''. These new domains include areas such as energy, water, and health care / life sciences. All of these are outside of the traditional IT focus for microelectronics research, yet, the new ``smarter planet'' domains may form the basis for future industries. This presentation will look at the evolution of IBM's research model and focus, shifting from one solely focused on IT, to one that compliments IT research with Smarter Planet domains. [Preview Abstract] |
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