Bulletin of the American Physical Society
60th Gaseous Electronics Conference
Volume 52, Number 9
Tuesday–Friday, October 2–5, 2007; Arlington, Virginia
Session DT1: Materials Processing in Low Pressure Plasmas I: Etching, deposition, new materials
1:30 PM–3:30 PM,
Tuesday, October 2, 2007
Doubletree Crystal City
Room: Crystal Ballroom A
Chair: Shahid Rauf, Applied Materials
Abstract ID: BAPS.2007.GEC.DT1.1
Abstract: DT1.00001 : A new generation of cryogenic processes for silicon deep etching
1:30 PM–2:00 PM
Preview Abstract Abstract
Author:
Remi Dussart
(GREMI - University of Orleans)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2007.GEC.DT1.1
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