Session A6: Novel Channel Materials for CMOS Technology

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Abstracts
Sponsoring Units: FIAP
Chair: Matthew Copel, IBM Thomas J. Watson Research Center
Morial Convention Center - RO4

Monday, March 10, 2008
8:00AM - 8:36AM

 A6.00001: III-V MOSFETs: From Materials {\&} Physics to Devices
Invited Speaker: Matthias Passlack

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Monday, March 10, 2008
8:36AM - 9:12AM

 A6.00002: Stability of Metal Oxide/Ge and Metal Oxide/III-V Interfaces and Implications for Low Defect Density MOS Devices
Invited Speaker: Paul McIntyre

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Monday, March 10, 2008
9:12AM - 9:48AM

 A6.00003: Dangling-bond defects and hydrogen passivation in germanium
Invited Speaker: Justin R. Weber

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Monday, March 10, 2008
9:48AM - 10:24AM

 A6.00004: Scanning-tunneling microscopy and spectroscopy of oxide deposition on III-V semiconductor surfaces
Invited Speaker: Andrew Kummel

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Monday, March 10, 2008
10:24AM - 11:00AM

 A6.00005: Monte Carlo simulations of carrier flow in novel gate materials
Invited Speaker: Massimo (Max) Fischetti

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