Session B32: Focus Session: Nanocontacts and Inhomogeneous Magnetic States
11:15 AM–2:15 PM, Monday, March 10, 2008
Morial Convention Center Room: 225
Sponsoring Units:
GMAG DMP
Chair: Andrei Slavin, Oakland University
Abstract ID: BAPS.2008.MAR.B32.2
Abstract: B32.00002 : Fabrication of point contacts by FIB patterning
11:51 AM–12:03 PM
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Abstract 
Authors:
B. O'Gorman
(University of Texas at Austin, Austin, TX)
M. Tsoi
(University of Texas at Austin, Austin, TX)
Nanoscale electrical contacts currently receive an increased amount of attention due to their capability to produce extremely high current densities needed, e.g., in experiments on current-driven precession and reversal of magnetization. Here we describe a new technique for the fabrication of such point contacts using a focused ion beam (FIB) patterning. FIB-fabricated point contacts combine the robustness and size-control of other lithographical methods with the flexibility of mechanical techniques to produce contacts to samples of arbitrary shape and composition. After sample coverage with a thin insulating layer (SiO), an FIB is used to mill a 100-nm-diameter hole through the insulator. Electrical contact to the sample is then made in-situ by filling the hole with a metal (Pt) using the ion beam assisted chemical vapor deposition capability of our FIB system. We have demonstrated the use of two such contacts (as an emitter and collector) in a transverse electron focusing (TEF) experiment. The contacts were made to a single crystal of bismuth, ballistic electrons were injected into the crystal through the emitter, and then focused onto the collector by a magnetic field. We see the expected voltage peaks at the collector as a function of the applied magnetic field.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2008.MAR.B32.2