Bulletin of the American Physical Society
APS March Meeting 2019
Volume 64, Number 2
Monday–Friday, March 4–8, 2019; Boston, Massachusetts
Session L33: Quantum Devices and 2D Materials
11:15 AM–2:03 PM,
Wednesday, March 6, 2019
BCEC
Room: 204B
Sponsoring
Unit:
FIAP
Chair: Eui-Hyeok Yang
Abstract: L33.00008 : Effects of Wet Transfer on Photoluminescence of WS2*
12:39 PM–12:51 PM
Presenter:
Siwei Chen
(Stevens Institute of Technology)
Authors:
XIAOTIAN WANG
(Stevens Institute of Technology)
Kyungnam Kang
(Stevens Institute of Technology)
Shichen Fu
(Stevens Institute of Technology)
Kyle Godin
(Stevens Institute of Technology)
Siwei Chen
(Stevens Institute of Technology)
Eui-Hyeok Yang
(Stevens Institute of Technology)
Here, we evaluated the effects of solvents and polymers involved in the wet etching transfer on the PL property of WS2. We used CVD-grown WS2 sample and simulate the transfer process by applying each solvent and polymer to WS2 respectively. The PL mapping results showed there is no significant reduction of PL intensity of WS2 before and after acetone, IPA, DI water and PMMA treatment. We then studied the effect of KOH on the PL intensities by transferring WS2 onto PDMS substrate using the Cu-based transfer method [1]. After 30% KOH solution treatment, the sample showed significant reduction of PL intensity compared to it before KOH treatment. We attribute that KOH molecules are physically adsorbed onto WS2, which can be removed through acid neutralization or high vacuum annealing.
[1] Z. Lin, et. al., Scientific reports, 5, 18596 (2015).
*CFN, BNL, DE-SC0012704
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