Bulletin of the American Physical Society
2016 Annual Spring Meeting of the APS Ohio-Region Section
Volume 61, Number 5
Friday–Saturday, April 8–9, 2016; Dayton, Ohio
Session D4: Contributed Session IV: General Physics
8:30 AM–9:30 AM,
Saturday, April 9, 2016
Room: SC128
Chair: Andy Chong, University of Dayton
Abstract ID: BAPS.2016.OSS.D4.5
Abstract: D4.00005 : Deep-UV interference lithography combined with masked contact lithography for pixel wiregrid patterns\textbf{~}
9:18 AM–9:30 AM
Preview Abstract Abstract
Authors:
David Lombardo
(Electro-Optics Graduate Program, University of Dayton, Dayton, Ohio 45469)
Piyush Shah
(Electro-Optics Graduate Program, University of Dayton, Dayton, Ohio 45469)
Pengfei Guo
(Electro-Optics Graduate Program, University of Dayton, Dayton, Ohio 45469)
Andrew Sarangan
(Electro-Optics Graduate Program, University of Dayton, Dayton, Ohio 45469)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2016.OSS.D4.5
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