Bulletin of the American Physical Society
2024 APS March Meeting
Monday–Friday, March 4–8, 2024; Minneapolis & Virtual
Session W46: Silicon Qubits IV - Characterization and Modeling |
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Sponsoring Units: DQI Chair: Felix Beaudoin, Nanoacademic Technologies inc Room: 200AB |
Thursday, March 7, 2024 3:00PM - 3:12PM |
W46.00001: Defining Specifications for Si/SiGe Qubit Devices Using Multiphysics Modeling Methods Fahd A Mohiyaddin, Roza Kotlyar, Thomas Watson, Mateusz Madzik, Felix F Borjans, Bishnu Patra, Lester Lampert, Elliot Connors, Joelle Corrigan, Rostyslav Savytskyy, Matthew J Curry, Daniel Keith, Simon Schaal, Florian Luthi, Josh Ziegler, Andrew J Wagner, Eric Henry, Hubert C George, Ravi Pillarisetty, Stefano Pellerano, Jeanette Roberts, Stephanie A Bojarski, Nathaniel C Bishop, James S Clarke The design of large-scale spin qubit arrays and their control infrastructure require expertise from various domains of semiconductor technology. In an industrial manufacturing environment, the design of qubit arrays will hence strongly benefit from defining clear specifications for various design parameters. Here, we employ a suite of Multiphysics simulation techniques to model Si/SiGe qubit devices and correlate them to experimental results to define parameter specifications for the qubits and for the devices hosting them. These include qubit related parameters such as qubit frequency, Rabi frequency, exchange coupling & spin coherence times – along with device parameters such as device potential uniformity, magnetic field gradients, isotopic purification, crosstalk, charge-noise and defect density. These specifications will be used to design the next generation spin qubit arrays at Intel. |
Thursday, March 7, 2024 3:12PM - 3:24PM |
W46.00002: Si/SiGe spin qubit with full 300mm process Clement Godfrin, Thomas Koch, Ruoyu Li, George Simion, Stefan Kubicek, Shana Massar, Yann Canvel, Julien Jussot, Julien Jussot, Roger Loo, Yosuke Shimura, Massimo Mongillo, Danny Wan, Wolfgang Wernsdorfer, Kristiaan De Greve 300mm process line has demonstrated its effeciency in producing spin qubits in silicon, confirming the idea that this platform is one of the most promising candidates for large scale quantum computers. In addition to scalability, the high reproducibility of 300mm processes allows a deterministic study of qubit metrics dependence on process parameters, essential for improving qubit quality. At IMEC, we built a strategy to efficiently optimize all the process parameters to produce better qubits. |
Thursday, March 7, 2024 3:24PM - 3:36PM |
W46.00003: Technology computer-aided design simulations of spin qubits in gated double quantum dots Pericles Philippopoulos, Raphaël J Prentki, Felix Fehse, Mohammad R Mostaan, Marek Korkusinski, Felix Beaudoin The design and engineering of classical silicon-based microelectronics often relies on a mature set of computational tools. Among these tools are technology computer-aided design (TCAD) software which are used to predict device performance and trends before fabrication. As we move toward using silicon for quantum technologies in the form of, e.g., spin qubits, it seems plausible that we will need to adopt best practices employed for classical semiconductor systems. However, because of the fundamental differences in operating principles between classical and quantum hardware, specialized quantum TCAD tools must be developed for quantum systems. In this work, we use the spin-qubit device modeling software package QTCAD to perform TCAD simulations of double-dot devices. In particular, we compute charge-stability diagrams, tunneling rates, and exchange energies in specific electron and hole silicon double-dot devices (e.g., FD-SOI devices) and predict how these properties can be modified by changing experimental configurations, starting only from device layouts and design rules. We identify schemes (e.g., based on the lever-arm and Hubbard approximations) which present sufficient accuracy while keeping computation times compatible with the rapid simulation requirements of the semiconductor industry. |
Thursday, March 7, 2024 3:36PM - 3:48PM |
W46.00004: Radio frequency reflectometry measurements on industrial CMOS Double Quantum Dot using superconducting spiral inductor Joffrey Rivard, Claude Rohrbacher, El Bachir Ndiaye, Ataellah Youcef Bioud, Matthieu Dominici, Alexis Morel, Dominic Leclerc, Christian Lupien, Clement Godfrin, Roy Li, Danny Wan, Stefan Kubicek, Kristiaan De Greve, Eva Dupont-Ferrier Silicon spin qubits, with their long coherence time and compatibility with industrial CMOS technology, hold great promise for large-scale quantum computing. As the number of spin qubits per chip continues growing, building industrial compatible devices is required for the necessary level of scalability and reproducibility to reach fault-tolerant quantum computing. In addition, a method for spin readout that minimizes the footprint is essential to achieve a large-scale quantum processor. In this context we present a reflectometry measurements of a spin compatible double quantum dot fully fabricated in a 300 mm integrated process at the IMEC manufacturing facility. |
Thursday, March 7, 2024 3:48PM - 4:00PM |
W46.00005: Tunnel and capacitive coupling optimization in FDSOI spin-qubit devices Valentin Labracherie, Grégoire Roussely, Heimanu Niebojewski, Hamza Sahin, Biel Martinez Diaz, Jing Li, Victor Millory, Bruna Cardoso-Paz, Tristan Meunier, Maud Vinet, Silvano De Franceschi, Romain Maurand, Boris Brun-Barriere, Yann-Michel Niquet, Benoit Bertrand The possibility to form well defined and long lived spin qubit in silicon as well as their compatibility with industrial CMOS technology have made them an attractive choice for building a large scale quantum computer. Within dense arrays of quantum dots (QDs), precise fine-tuning and accurate determination of operating conditions will be imperative for each individual spin qubit. |
Thursday, March 7, 2024 4:00PM - 4:12PM |
W46.00006: Tuning and operation of quantum dots using FPGA tools tailored for spin qubits Marc-Antoine Roux, Joffrey Rivard, Claude Rohrbacher, Alexis Morel, Dominic Leclerc, El Bachir Ndiaye, Larissa Njejimana, Francesco Tafuri, Brendan Bono, Philip Krantz, Roy Li, Clement Godfrin, Stefan Kubicek, Danny Wan, Kristiaan De Greve, Marc-André Tétrault, Eva Dupont-Ferrier, Michel Pioro-Ladrière Main challenges in the development of a spin qubit quantum processor include tuning of large arrays of quantum dots to compensate for dot-to-dot variability and fast operation of gates which control the quantum dots for the implementation of error-correcting protocols. |
Thursday, March 7, 2024 4:12PM - 4:24PM |
W46.00007: Gate-based spin readout in planar Si-MOS quantum dots using an off-chip microwave resonator. Frédéric Schlattner, David Ibberson, Ross C. Leon, Michael Fogarty, Jacob Chittock-Wood, Sofia Patomäki, Felix-Ekkehard von Horstig, Stefan Kubicek, Fernando Gonzalez-Zalba, John Morton Planar Si-MOS technology provides a promising platform to build scalable two-dimensional arrays with nearest neighbor connectivity needed to implement, efficiently, the surface code [1]. Reflectometry techniques can perform spin read-out through the gate and are therefore a promising approach to read out dense two-dimensional qubit arrays without compromising the qubit connectivity. However, in planar technologies, efforts to achieve high-fidelity gate-based read-out have been hindered by multiple factors, such as lower gate lever arms and parasitic two-dimensional electron gases in accumulation mode devices. In this work, we interface the quantum device fabricated on a 300mm wafer with a newly developed high-impedance off-chip resonator at 1.32 GHz. With our approach, we demonstrate dispersive detection of an inter-dot charge transition with a state-of-the-art signal-to-noise ratio of 1 in 100 us in planar Si-MOS [2] and perform singlet-triplet spin readout via Pauli spin blockade. |
Thursday, March 7, 2024 4:24PM - 4:36PM |
W46.00008: Charge-noise spectroscopy using exchange oscillations in Si/SiGe spin qubits Praveen Sriram, Daniel Keith, Thomas Watson, Elliot Connors, Felix Borjans, Mateusz Madzik, Jeanette Roberts, James S Clarke Electron spins in silicon quantum dots are a promising qubit platform due to their long coherence times, small footprint, and compatibility with industrial fabrication. Recent advances with isotopically purified silicon and heterostructure quality have enabled single-qubit and two-qubit fidelities beyond the threshold for fault-tolerant operation, limited by charge-noise in the host semiconductor. We measure the charge-noise spectrum in a Si/SiGe singlet-triplet qubit on Intel’s latest testchip [1], over nearly 11 decades of frequency using exchange oscillations biased in the detuning-sensitive regime. Dynamically decoupling low-frequency noise with up to 128 π-pulses [2] enables the design of filter functions to probe charge-noise at tens of MHz, revealing a 1/f spectrum over the entire frequency range of our measurements. The charge-noise spectrum provides key insights for evaluating heterostructure quality, fabrication process flows, and developing noise mitigation strategies, including dynamically corrected gates for suppressed noise sensitivity and higher single and two-qubit fidelities. |
Thursday, March 7, 2024 4:36PM - 4:48PM |
W46.00009: Reconfigurable quadruple quantum dot linear array with tunable couplings and dispersive sensing Kalid Ulas, Felix-Ekkehard von Horstig, Heimanu Niebojewski, M Fernando Gonzalez-Zalba, Thierry Ferrus, Charles Smith, Frederico Martins We discuss measurement results on a device that we show can demonstrate spin-based manipulation and readout in a multi-gate CMOS device. An array of four dot gates in series control the charge occupancy of their respective underlying quantum dots, while five independently tuneable exchange gates regulate their inter-dot coupling. Such a structure can form the basis of various qubit device configurations, whether that be a 4 quantum dot device or a 2 or 3 quantum dot device along with a corresponding sensing quantum dot. |
Thursday, March 7, 2024 4:48PM - 5:00PM |
W46.00010: Fast cryogenic probing of quantum dot spin qubit devices Andreas V Kuhlmann, Simon Geyer, Mathieu de Kruijf, Felix Schupp, Stephan Paredes, Matthias Mergenthaler, Dominik M Zumbuhl, Richard J Warburton, Toni Berger, Lisa Sommer, Rafael S Eggli Fast feedback from cryogenic electrical characterization measurements is key for the successful development of scalable quantum computing technology. At room temperature, high-throughput device testing is accomplished with a probe-based solution, where electrical probes are repeatedly positioned onto devices for acquiring statistical data. In this work, we present a probe station that can be operated from room temperature down to 1.4 K [de Kruijf et al., Rev. Sci. Instrum. 94, 054707 (2023)]. It is designed for 2x2 cm2 chips, that are moved with respect to a multi-contact probe card using closed-loop piezo-based positioners. This prober is compact enough to fit inside a standard cryogenic magnet system and is compatible with both direct-current and radio-frequency signals, thereby making it a versatile tool perfectly suited for gathering statistical data on qubits. A large variety of electronic devices can be tested. We showcase the performance of the prober by characterizing silicon fin field-effect transistors as a host for quantum dot spin qubits [Camenzind and Geyer et al., Nat. Electron. 5, 178 (2022)]. Such a tool can massively accelerate the design-fabrication-measurement cycle and provide important feedback for process optimization toward building scalable quantum circuits. |
Thursday, March 7, 2024 5:00PM - 5:12PM |
W46.00011: Spin Qubits with Integrated millikelvin CMOS Control Samuel Bartee, William Gilbert, Kun Zuo, Kushal Das, Tuomo I Tanttu, Henry Yang, Nard D Stuyck, Rachpon Kalra, Sebastian Pauka, Rocky Y Su, Wee Han Lim, Santiago Serrano, Christopher Escott, Fay E Hudson, Kohei M Itoh, Arne Laucht, Andrew S Dzurak, David Reilly A key virtue of spin qubits is their tiny submicron footprint, enabling billions of qubits to fit on a single silicon wafer. With each qubit requiring a handful of gate electrodes for control, however, a formidable challenge arises in the management of this extreme interconnect density. Monolithic integration of qubits with CMOS-based control circuits can potentially address this challenge, although the impact of heat and crosstalk on the qubits is likely to pose a significant risk to this approach. An alternate architecture1 leverages heterogeneous ‘chiplet’ style packaging in which the control circuits and qubits are proximal, but positioned on separate dies and wired-up using dense, lithographically defined interconnects at milli-kelvin temperatures. Here, we report the realization of a cryo-CMOS control architecture (based on 28 nm FDSOI) and benchmark its performance using silicon MOS-style electron spin qubits2. The fidelity of both single- and two-qubit gate operations acts to probe the impact of heat and noise arising from the cryo-CMOS control circuits. These results suggest that heterogeneous integration is a viable means of scaling-up the control interface of spin-based quantum processors. |
Thursday, March 7, 2024 5:12PM - 5:24PM |
W46.00012: Characterization of Cryo-CMOS heating and noise properties using Silicon spin qubits Samuel Bartee, Will Gilbert, Kun Zuo, Kushal Das, Tuomo I Tanttu, Henry Yang, Nard D Stuyck, Rachpon Kalra, Sebastian Pauka, Yue Su, Wee Han Lim, Santiago Serrano, Christopher Escott, Fay E Hudson, Kohei M Itoh, Arne Laucht, Andrew S Dzurak, David Reilly Cryo-CMOS has previously been demonstrated as a promising control interface for large-scale spin qubit quantum computation. However, its substantial heat dissipation has limited its integration to the 4K stage of a dilution fridge. In this talk, we employ an approach developed earlier in our group [1], utilizing Cryo-CMOS at an ultra-low temperature of 20 mK. Leveraging spin qubits as probing tools, we conduct a comprehensive examination of the Cryo-CMOS chip's thermal and noise properties and their concurrent impact on spin qubits across a wide parameter space. Our findings provide valuable insights for enhancing cryo-CMOS technology, particularly in the context of its heterogeneous integration with silicon spin qubits, advancing the prospects of quantum computing architectures. |
Thursday, March 7, 2024 5:24PM - 5:36PM |
W46.00013: Characterization of Multiple Qubit Encodings in Industrially-Manufactured Silicon Quantum Dots Jacob D Henshaw, Malick A Gaye, Matthew J Curry, Rohith Vudatha, Natalie D Foster, Noah T Jacobson, Jay C LeFebvre, Lester Lampert, Dwight R Luhman, Ryan M Jock
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Thursday, March 7, 2024 5:36PM - 5:48PM |
W46.00014: Oral: Advances in Spin Qubit Devices: Interconnect and Magnet Optimization for Scalability Larysa Tryputen, David J Michalak, Timo J. J Willigers, Hitham Amin, Saurabh Karwal, Sergey V Amitonov, Amir Sammak, Eftychia Tsapanou-Katranara, Önder Gül, Luca Mazzarella, Gertjan Eenink, Yoram Vos, Rick N. M Wasserman, Rabah Hanfoug, Nodar Samkharadze, Giordano Scappucci, Menno Veldhorst, Lieven M. K Vandersypen Recent developments in control of spin qubits have shown exciting results [1,2]. In order to successfully scale quantum chips to larger numbers of high-fidelity qubits, improvement in the quality of the material is necessary. In this talk, we present some of our recent work on metals, magnetic material, and dielectric material analysis used in the fabrication of our spin qubit devices. Such analyses are critical to get a better understanding on how to improve performance of our devices to increase scalability. First, we describe the multi-layered test structures added alongside the spin qubit devices in order to evaluate how material properties change throughout the fabrication process [3]. We find that selected fabrication steps lead to increase in the resistivity of the palladium interconnects. Then, we discuss the optimization of the magnetic films used to create the micromagnets that are used for qubit driving and addressability. Finally, with metal-insulator-metal devices, we evaluate the quality of the dielectric material and show what impact the lithographic process (e.g., optical vs. e-beam) has on its reliability. |
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