Bulletin of the American Physical Society
2024 APS March Meeting
Monday–Friday, March 4–8, 2024; Minneapolis & Virtual
Session S57: Growth and Characterization of 4d/5d Oxides
8:00 AM–11:00 AM,
Thursday, March 7, 2024
Room: 205C
Sponsoring
Unit:
DMP
Chair: Lior Kornblum, Technion - Israel Institute of Technolog
Abstract: S57.00002 : Tuning Electronic states and Phases of Transition Metal Oxides
8:36 AM–9:12 AM
Presenter:
Milan Radovic
(Paul Scherrer Institut)
Author:
Milan Radovic
(Paul Scherrer Institut)
Collaborations:
Carmine Autieri, Mario Cuoco, Zhiming Wang, M, Caputo, Z. Ristic, T. Das, N. C. Plumb, C. Piamonteze
The first example, heterostructures made of SrIrO3 (SIO) and SrRuO3 (SRO) ultrathin layers, shows formation of the metallic phase despite both constituents being insulators. Combing transport, magnetic, and angle-resolved photoemission experiments (ARPES) with the first principal calculation, we disclose that the insulator-to-metal transition is driven by the interface occurrence of an astonishing Dzyaloshinskii-Moriya interaction (DMI) at the SIO-SRO interface, which induces interface ferromagnetism [1].
The second case depicts that the magnetic and electronic properties of ultrathin NdNiO3 (NNO) film in proximity to ferromagnetic (FM) La2/3Sr1/3MnO3 (LSMO) layer drastically contradict its bulk form. Employing X-ray magnetic circular dichroism (XMCD), ARPES, and the first principal calculation reveal the direct magnetic coupling between the nickelate film and the manganite layer, which causes an unusual ferromagnetic (FM) phase in NNO. Consequently, the insulating AFM ground state in the NNO layer is quenched in proximity to the FM layer.
Both results demonstrate that heterogeneous engineering of magnetic interactions can be a powerful tool to generate and control emergent electronic properties that do not exist in ultrathin pure film.
Overall, our studies established approaches to manipulating the properties and phases (electronic and magnetic) in TMOs, signifying their perspectives as quantum materials for novel applications.
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