Bulletin of the American Physical Society
2024 APS March Meeting
Monday–Friday, March 4–8, 2024; Minneapolis & Virtual
Session Q01: Growth and Engineering of 2D Materials
3:00 PM–5:48 PM,
Wednesday, March 6, 2024
Room: L100A
Chair: Bernard Field, Lawrence Berkeley National Laboratory; Mohammed Sayyad, Arizona State University
Abstract: Q01.00003 : Direct growth of graphene on transition metal oxides via atmospheric pressure chemical vapor deposition*
3:48 PM–4:00 PM
Presenter:
Yeongju Choi
(Department of Physics, Sungkyunkwan University)
Authors:
Yeongju Choi
(Department of Physics, Sungkyunkwan University)
Dongwon Shin
(Department of Physics, Sungkyunkwan University)
Seung Jin Lee
(Department of Energy Science, Sungkyunkwan University)
Minjae Kim
(Department of Physics, Sungkyunkwan University)
Woo Seok Choi
(Department of Physics, Sungkyunkwan University)
Ki Kang Kim
(Department of Energy Science, Sungkyunkwan University)
Jungseek Hwang
(Department of Physics, Sungkyunkwan University)
Collaborations:
EPIC Oxide Lab, Department of Physics, Sungkyunkwan University, NNR, Department of Energy Science, Sungkyunkwan University, IRS-AQML, Department of Physics, Sungkyunkwan University
In this study, we directly synthesized graphene on SrTiO3 (001) substrates at 1100°C, utilizing Ar, H2, and CH4 as precursors via atmospheric pressure CVD (APCVD) method. We successfully fabricated full coverage (5x5 mm2) of high-quality graphene on SrTiO3 substrates with preserving the SrTiO3 step-terrace structure, confirmed by Raman spectroscopy, atomic force microscopy, and scanning electron microscopy. We found that full coverage of graphene on SrTiO3 via APCVD necessitates a sufficient deposition temperature and CH4 flow. Furthermore, we observed that the reduction of the H2 flow rate improves graphene quality with less residues at the surface. We also conducted the direct fabrication of graphene on other TMO substrates, especially LaAlO3 and (LaAlO3)0.3(SrAl0.5Ta0.5O3)0.7. Our research offers to standardize the fabrication method for enabling the production of high-quality graphene/TMO hybrid heterostructures using APCVD.
[1] Kang et al., Adv. Mater, 34, 1803732 (2019).
[2] Park et al., Nano Lett, 3, 1754-1759 (2016).
[3] Kang et al., Adv. Mater, 18, 1700071 (2017).
[4] Shin et al., Adv. Funct. Mater, Early Veiw, 2311287 (2023).
[5] Munoz et al., Chem. Vap. Deposition, 19, 297-322 (2013).
[6] Wu et al., RSC Adv, 9, 41447-41452 (2019).
[7] Yoon et al., Sensors. 10, 3944 (2022).
*National Research Foundation of Korea (NRF-2021R1A2C2011340 and No. RS-2023-00220471).
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