Thin Films Using RF Magnetron Sputtering

Transparent p-n junctions continue to receive growing interest due to their potential applications in optoelectronic devices, transparent solar cells, and light-emitting diodes. Transparent conducting oxides (TCO), compound semiconductors with oxygen nonmetal part, have shown promising features. However, many developed materials are limited by small carrier mobility, low transparency and/or high-cost fabrication. There is therefore a need to develop more efficient materials. In this presentation, we will discuss the fabrication and characterization of Cr₂MnO₄ thin films deposited on Al2O3 film substrates by radio-frequency (RF) magnetron sputtering method in a controlled mixture of Ar and O2 gas. A detailed discussion on the structural, electrical and optical properties of the films will be presented.