Bulletin of the American Physical Society
APS March Meeting 2022
Volume 67, Number 3
Monday–Friday, March 14–18, 2022; Chicago
Session A71: Growth and Synthesis of 2D Materials and HeterostructuresFocus Recordings Available
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Sponsoring Units: DMP Chair: Pengpeng Zhang, Michigan State University Room: Hyatt Regency Hotel -Jackson Park C |
Monday, March 14, 2022 8:00AM - 8:36AM |
A71.00001: Templated synthesis of low dimensional films and heterostructures on freestanding graphene membranes Invited Speaker: Robert G Moore Low dimensional films and layered heterostructures, including topological materials and transition metal dichalcogenides, have incredible potential for a wide array of applications due to the flexibility and tunability of their unique properties. Key challenges for realizing such potential include understanding how interfacial structure and defects affect desired properties and their incompatibility with existing nanofabrication techniques. Here we present a “templated synthesis” approach where freestanding monolayer graphene extended over arbitrary surfaces and patterned structures is used as a substrate for the synthesis of high-quality films of topological materials and hybrid interfaces between different materials. This approach has enabled the synthesis and direct characterization of the atomic and interfacial structure of as-grown low dimensional films and heterostructures using scanning transmission electron microscopy (STEM) for comparison to the electronic structure revealed by scanning tunneling spectroscopy (STS) and angle resolved photoemission spectroscopy (ARPES). The templated synthesis approach also helps bridge the gap between low dimensional materials and traditional semiconductor nanofabrication techniques, opening a route towards development of device structures with novel functionality. |
Monday, March 14, 2022 8:36AM - 9:12AM |
A71.00002: Synthesis of 2D Materials. Invited Speaker: Sefaattin Tongay
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Monday, March 14, 2022 9:12AM - 9:24AM |
A71.00003: Epitaxial Synthesis of Highly Oriented 2D Janus Rashba Semiconductor BiTeCl and BiTeBr Debarati Hajra "Janus" 2D crystals Bismuth Tellurohallides (BiTeX, X=Cl, Br, I) are stacked layers of X, Bi and Te planes. The members of this family show giant Rashba spin splitting, which makes them ideal candidates for room temperature spintronics without the need of an external magnetic field1. Previous experimental studies of BiTeX were performed on the exfoliated samples from bulk BiTeX, which is non-scalable and lacks reproducibility2. No thin film growth with controlled thickness and orientation has been reported, which is essential to explore the atomic level phenomena and device integration. Here, the first epitaxial growth of highly crystalline and orientation controlled BiTeCl and BiTeBr is reported which was achieved by a two-step conversion process. The synthesis method includes the physical vapor deposition of Bi2Te3 nanosheets on c-cut sapphire and next, conversion of the Bi2Te3 sheets to BiTeCl(Br) by exposure to BiCl(Br)3 vapor. The existence and uniformity of Janus BiTeX was confirmed by Raman mapping of A11 vibrational mode and energy dispersive X-ray spectroscopy after conversion. Stability of these Janus sheets was also studied by time dependent Raman spectroscopy. Overall, this work offers a new pathway to synthesize few layers of Janus compounds. |
Monday, March 14, 2022 9:24AM - 9:36AM |
A71.00004: Influence of trace oxygen species on chemical vapor deposition (CVD) graphene growth kinetics Jacob Amontree, Xingzhou Yan, James C Hone, Richard Martel Deliberate oxidation of copper substrates prior to CVD graphene growth has proven to significantly alter the nucleation density, grain size, and defect concentration of the resulting film. Here we develop a model to discuss the role of part-per-million oxygen in gas feedstocks on graphene growth kinetics. By eliminating trace oxygen in the gas feedstock and furnace atmosphere, we obtain fast, high-quality growth without the reliance of hydrogen to balance oxygen species. We demonstrate the formation of a pinhole-free, continuous graphene within 1 min due to the lack of oxygen impurities. The O2/H2 ratio was explored to understand the balance between grain growth and oxygen-based etching. This study sets the maximum oxygen concentration with respect to hydrogen to facilitate fast, reproducible graphene growth. Our findings highlight the competitive nature of absorbed methane intermediate species as carbon precursors and trace surface oxide as the growth inhibitor and set the limit between impurities limited growth and methane adsorption-dissociation limited growth. We assert that CVD graphene growth in standard ultra-high purity gas feedstock without downstream purification falls within the impurities limited growth regime, thus is held at the mercy of oxidizing etching reactions. |
Monday, March 14, 2022 9:36AM - 9:48AM |
A71.00005: Determining intrinsic defect densities for high-quality self-flux synthesized transition metal dichalcogenides from first principles and experimental thermodynamics Luke Holtzman, Preston A Vargas, Song Liu, James C Hone, Richard G Hennig, Katayun Barmak Two-dimensional transition metal dichalcogenides (TMDs) have gained interest due to their novel optical and electronic phenomena and potential for optoelectronic applications. Chemical vapor deposition (CVD) and chemical vapor transport (CVT) are commonly used to synthesize TMDs due to their fast growths and high yields; however, they produce highly defective TMDs, negatively impacting the novel properties. Alternatively, the self-flux growth method has been shown to yield TMDs with defect densities several orders of magnitude lower than those from CVD and CVT. Yet, it is unknown how close the self-flux TMDs quality is to the intrinsic equilibrium defect density. In this work, we perform density functional theory calculations for intrinsic defects and substitutional oxygen impurities in WSe2. We use ab initio modeling in conjunction with experimental thermodynamic data to calculate equilibrium formation energies and defect densities as a function of growth temperature. Theoretical defect densities at the self-flux growth conditions were shown to be an order of magnitude less than experimental values. The defect density difference between experiment and theory suggests that equilibrium was not reached, and kinetic or impurity factors alter the self-flux TMDs defect densities. |
Monday, March 14, 2022 9:48AM - 10:00AM |
A71.00006: Single crystal growth and characterization of RuCl3 intercalated graphite Nan Huang, Shirin Mozaffari, Matthew A Cothrine, Kevin M Roccapriore, Bryan C Chakoumakos, Katharine Page, Panchapakesan Ganesh, David G Mandrus |
Monday, March 14, 2022 10:00AM - 10:12AM |
A71.00007: Thin-film transition metal dichalcogenide growth fromheterostructuredbulk metallic patterns William Poston, Norah Aldosari, Gregory Jensen, Eric Stinaff, Maryam Bizhani, Ruhi Thorat, Thushan E Wickramasinghe, Shrouq H Aleithan Much research has been dedicated to synthesis of two-dimensional transition metal dichalcogenide (TMD) materials as well as their alloys and heterostructures, particularly by chemical vapor deposition (CVD). We will present initial investigations into potential alloying and heterostructure formation using a CVD method where vertical stacks of bulk transition metal films (Mo and W) are deposited in lithographically defined patterns which act as source material for the CVD reaction. Resultant lateral TMD growth was found to depend on the stacking order of the Mo and W. Interestingly, we have observed that often the predominant TMD formed is based on the first metal deposited, though covered by the second metal. For example, when W is the bottom metal, the lateral growth is predominantly WS2 in all samples even though the W is ‘capped’ by the Mo. Whereas, when Mo is the bottom metal, the growth is predominantly MoS2 in half of the samples and WS2 in the other half, for given growth conditions. For specific growth parameters we observe an enhancement in the WS2 growth in the presence of the Mo capping. We will present results from characterization using Raman and photoluminescence spectroscopy, SEM imaging, and EDX and discuss possible growth mechanisms. |
Monday, March 14, 2022 10:12AM - 10:24AM |
A71.00008: Liquid-Solid Assisted synthesis of 2D M2X Materials Muhammad Arslan Shehzad Two-dimensional transition metal dichalcogenides (TMDs) MX2 with M = (W, Mo) and X = (Te, Se, S) are known for their layered structure which yields extraordinary electronic properties. However, other transition metal chalcogenides have been rarely reported. In this work, we have used liquid−solid interface growth which enables us to synthesize layered group 11 chalcogenides with a focus on hexagonal Cu2X (X=Te, Se, S) crystal system. It is observed that liquid copper plays a significant role in synthesizing these new 2D material systems. Like traditional TMDs, thickness-dependent phonon signatures are observed, and a high-resolution atomic structure reveals a hexagonal layered phase of Cu2Te that prefers to grow in lattice-matched layers. Theoretical calculations on these structures show thickness-dependent metallic and semiconducting natures, suggesting a promising potential for 2D material electronics. As theoretically predicted 1 these materials cover a large range of bandgap i.e. 0.2 to 2.8 eV, high carrier mobilities, we believe this work opens a new paradigm in the utility of these materials in a variety of applications. |
Monday, March 14, 2022 10:24AM - 10:36AM |
A71.00009: Ultra-Confined Lateral Heterostructures in 2D Semiconductors Hossein Taghinejad, Mohammad Taghinejad, Qitong Li, Ali Eftekhar, Pulickel Ajayan, Mark Brongersma, Wenshan Cai, James G Analytis, Ali Adibi Spatial confinement drives most quantum effects in semiconductors. In two-dimensional (2D) materials, the gifted confinement along the out-of-plane direction enables a plethora of quantum effects and unprecedented properties. Extra degrees of confinement within the plane of 2D materials requires the development of advanced material synthesis methods combined with state-of-the-art nanofabrication techniques. Towards this goal, the formation of lateral junctions between heterogeneous 2D materials has been intensely pursed. However, the degree of spatial confinements offered by available techniques is far from dimensions at which quantum effects start to emerge. Here, we present a technique that enables the synthesis of lateral heterostructures with dimensions as small as a few tens of nanometers, in isolated or periodic fashions, in predefined locations, and with tunable material compositions. The prospect of the developed method for the realization of quantum devices based on 2D lateral heterostructures will be discussed. |
Monday, March 14, 2022 10:36AM - 10:48AM |
A71.00010: Growth of two dimensional antiferromagnetic CrCl3 flakes down to monolayer thickness Jia Wang, Zahra Ahmadi, Jeffrey Shield, Xia Hong The van der Waals (vdW) CrCl3 is a two-dimensional (2D) antiferromagnet. Previous reports have mainly focused on mechanically exfoliated samples, while controlled synthesis of high quality CrCl3 thin flakes is critical for their application in 2D spintronics. Here, we report the growth of ultrathin CrCl3 flakes with well-defined shapes down to monolayer thickness (~0.7 nm) via physical vapor transport technique. Confocal Raman measurements show that the CrCl3 flakes are crystalized in the monoclinic structures at room temperature, consistent with high-resolution transmission electron microscopy results. We carry out atomic force microscopy and electrical characterizations on CrCl3 flakes with various thicknesses as a function of time. Thick CrCl3 flakes (>50 nm) show excellent ambient stability for up to 5 months after growth, while ultrathin flakes show sign of degradation in 5 days. We also investigate the electrical properties of graphene/CrCl3/graphene heterostructures. |
Monday, March 14, 2022 10:48AM - 11:00AM |
A71.00011: Epitaxial ultraclean, wrinkle-free graphene and in-plane heterostructure growth on Cu(111) surface in an oxygen-free environment Xingzhou Yan, Jacob Amontree, James C Hone, Katayun Barmak Chemical vapor deposition (CVD)-derived graphene performance has shown to deteriorate with surface wrinkles, folds, and transfer-related contaminations. Towards the stitching-up phase of the graphene growth, the lack of active catalytic copper surface slows down the growth rate and leads to an excess of amorphous carbon formation. With the integration of an oxygen-free growth environment and a Cu(111) growth substrate; flat, clean, and intrinsic defect-free graphene can be reproducibly grown with an enhanced growth rate via low pressure CVD (LPCVD). The resulting sheet of graphene shows an epitaxial relationship with the substrate. Contamination-free graphene surface also enables clean transfer due to the absence of amorphous carbon and structural defects in the graphene sheet. Electrical measurements with h-BN encapsulation demonstrates carrier mobility comparable to exfoliated graphene, with ballistic transport characteristics at cryogenic temperature. In addition, in-plane h-BN-graphene heterostructures can be fabricated for the first time, which is the ideal platform as a low friction substrate for rotating moiré devices, further enabling possibilities towards 2D circuitry. |
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