Rapid thermal processing of self-assembling block copolymer thin films on flat surfaces and topographically defined patterns

Self-assembling block copolymers generate nanostructured patterns, which are potentially useful for a wide range of applications. However, their technological implementation is prevented by the very long time required to drive the process. In this contribution, we demonstrate the capability to control the morphology of the self-assembling process of cylinder forming PS-b-PMMA diblock copolymer (DBC) thin films deposited on un-patterned and topographically patterned surfaces by means of a Rapid Thermal Processing (RTP) machine. Highly ordered patterns were obtained on flat surfaces for perpendicular-oriented cylindrical PS-b-PMMA block copolymers in less than 60 s. The BCs morphology evolution within topographically defined structures was systematically investigated as well. Irrespective of the surface neutralization, an irreversible orientational flipping of the BCP microdomains inside the trenches was observed. This effect was attributed to de-swelling of the polymeric film as a consequence of a progressive desorption of the solvent retained inside the film.