APS March Meeting 2013
Volume 58, Number 1
Monday–Friday, March 18–22, 2013;
Baltimore, Maryland
Session T20: Focus Session: Electron, Ion, and Exciton Transport in Nanostructures - Resistive Switching Phenomena
8:00 AM–11:00 AM,
Thursday, March 21, 2013
Room: 322
Sponsoring
Unit:
DMP
Chair: Luca Larcher, Universita di Modena e Reggio Emilia
Abstract ID: BAPS.2013.MAR.T20.7
Abstract: T20.00007 : Nanoionic switching in metal oxide nanostructures
9:36 AM–10:12 AM
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Abstract
Author:
Daniele Ielmini
(Politecnico di Milano)
Ion migration in oxide nanostructures is a key process in information
storage technologies, where the logic data are stored as nanoscale
conductive filaments [1]. Due to the inherently nanoscale size of the ionic
switching location (few cubic nanometers), the local electric field and
current density induce extremely high temperatures as a result of Joule
heating [2,3]. To develop and design advanced nanoionic materials and
devices with improved performance and reliability, the ion migration
phenomena in metal oxides must be carefully understood and modeled.
This talk will address the modeling of ionic migration and the consequent
switching in HfO$_{\mathrm{x}}$ layers of RRAM devices [4]. The model solves
drift/diffusion equations for thermally-activated hopping of positive ion,
such as oxygen vacancies (V$_{\mathrm{O}}^{+})$ and metal cations
(Hf$^{+})$, in presence of intense Joule heating and electric
field. The impact of the ion distribution on the local conductivity is
described physics-based models of defect-assisted electronic conduction in
semiconductors [5,6]. Microscopic parameters, such as the energy barrier for
ion hopping, are directly inferred from the experimental switching kinetics
at variable voltages. The simulation results picture the filament
growth/depletion with time and account for the observed switching
characteristics, such as the progressive opening of a depleted gap and the
possibility of electrode-to-electrode migration of ions. Finally, new
phenomena, such as switching variability at atomic-size filaments and
stress-induced symmetric switching, will be discussed.\\[4pt]
[1] R. Waser, et al., Adv. Mater. 21, 2632 (2009).\\[0pt]
[2] D. Ielmini, et al., Nanotechnology 22, 254022 (2011).\\[0pt]
[3] S. Menzel, et al., Adv. Funct. Mater. 21, 4487 (2011).\\[0pt]
[4] S. Larentis, et al., IEEE Trans. Electron Devices 59, 2468 (2012).\\[0pt]
[5] H. D. Lee, et al., Phys. Rev. B 81, 193202 (2010).\\[0pt]
[6] D. Ielmini, Phys. Rev. B 78, 035308 (2008).
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2013.MAR.T20.7