Bulletin of the American Physical Society

APS March Meeting 2012

Volume 57, Number 1

Monday–Friday, February 27–March 2 2012; Boston, Massachusetts

Session Index

Session H45: Focus Session: Thin Film Block Copolymers - Phase Behavior	Show Abstracts
Sponsoring Units: DPOLY Chair: Andrew Croll, North Dakota State University Room: 159

Tuesday, February 28, 2012 8:00AM - 8:36AM		H45.00001: Polymer Physics Prize Break
Tuesday, February 28, 2012 8:36AM - 8:48AM		H45.00002: Controlling the Orientation of Block Copolymer Thin Films with Selective and Neutral Nanoparticles Misang Yoo, Seyong Kim, Bumjoon J. Kim, Joona Bang Preview Abstract
Tuesday, February 28, 2012 8:48AM - 9:00AM		H45.00003: Assembly and Photo-Induced Disorder in Block Copolymer-Additive Systems Li Yao, James Watkins Preview Abstract
Tuesday, February 28, 2012 9:00AM - 9:12AM		H45.00004: Diblock copolymer morphologies in ultra thin films under shear Marco Pinna, Andrei Zvelindovsky, Xiaohu Guo, Christine Stokes Preview Abstract
Tuesday, February 28, 2012 9:12AM - 9:24AM		H45.00005: Structure and dynamics of random block copolymers in the bulk and thin films Marcus M{\"u}ller, Birger Steinm{\"u}ller, Keith H. Hambrecht, Grant D. Smith, Dmtiry Bedrov Preview Abstract
Tuesday, February 28, 2012 9:24AM - 9:36AM		H45.00006: Macrophase Separation of Block Copolymer Blends in Thin Films Lance Williamson, Paul Nealey Preview Abstract
Tuesday, February 28, 2012 9:36AM - 9:48AM		H45.00007: Phase segregation at the sub-5-nm scale using high $\chi $ Poly(ethylene oxide-b-dimethylsiloxane) copolymers Damien Montarnal, Glenn Fredrickson, Edward Kramer, Craig Hawker Preview Abstract
Tuesday, February 28, 2012 9:48AM - 10:00AM		H45.00008: Decoupling Bulk Thermodynamics and Wetting Characteristics of Block Copolymer Thin Films Sangwon Kim, Paul Nealey, Frank Bates Preview Abstract
Tuesday, February 28, 2012 10:00AM - 10:12AM		H45.00009: Continuity and connectivity of lamellar-forming block copolymers in thin films Ian Campbell, Mark Stoykovich Preview Abstract
Tuesday, February 28, 2012 10:12AM - 10:24AM		H45.00010: Theoretical and Experimental Investigations of Contact Hole Shrink using PS-PMMA Block Copolymers Valeriy Ginzburg, Phillip Hustad, Jeffrey Weinhold, Rahul Sharma, Vivian Chuang, Peter Trefonas Preview Abstract
Tuesday, February 28, 2012 10:24AM - 10:36AM		H45.00011: Tailoring block copolymer morphology via control of topographical surface: A self consistent field theoretic study Xianggui Ye, Brian J. Edwards, Bamin Khomami Preview Abstract
Tuesday, February 28, 2012 10:36AM - 10:48AM		H45.00012: Silicon patterning using self-assembled PS-b-PAA diblock copolymer masks for anti-reflective black silicon fabrication via plasma etching Xin Zhang, Christopher J. Metting, Sean Fackler, Robert M. Briber, Andrei B. Sushkov, H. Dennis Drew Preview Abstract
Tuesday, February 28, 2012 10:48AM - 11:00AM		H45.00013: Assembly of block copolymer films between chemically patterned and chemically homogeneous surface Jeong In Lee, Huiman Kang, Hyo Seon Suh, Christopher Thode, Lei Wan, Abelrado Hernandez, Yasuhiko Tada, Hiroshi Yoshida, Juan de Pablo, Paul Nealey Preview Abstract

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Bulletin of the American Physical Society

APS March Meeting 2012

Volume 57, Number 1

Monday–Friday, February 27–March 2 2012; Boston, Massachusetts

Session Index

Session H45: Focus Session: Thin Film Block Copolymers - Phase Behavior

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