Monday, February 27, 2012
11:15AM - 11:27AM
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B45.00001: ABSTRACT WITHDRAWN
Preview Abstract |
Monday, February 27, 2012
11:27AM - 11:39AM
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B45.00002: Effect of Solvent Removal Rate on the Morphology of Solvent Vapor Annealed ABA Triblock Copolymer Thin Films
Julie N. L. Albert, Wen-Shiue Young, Ronald L. Lewis, III, Timothy D. Bogart, Jasmine R. Smith, Thomas H. Epps, III
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Monday, February 27, 2012
11:39AM - 11:51AM
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B45.00003: Obtaining Perpendicular Block Copolymer Morphologies with Solvent Annealing
Kevin Gotrik, Jeong Gon Son, Adam Hannon, Caroline Ross
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Monday, February 27, 2012
11:51AM - 12:03PM
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B45.00004: Mesoscale Dynamics of Solvent Evaporation in Block Copolymer Thin Films
Sean Paradiso, Su-mi Hur, Kris Delaney, Hector Ceniceros, Carlos Garcia-Cervera, Glenn Fredrickson
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Monday, February 27, 2012
12:03PM - 12:15PM
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B45.00005: Optimizing the Combination of Solvent Annealing and Directed Self-Assembly in Thin Film Block Copolymer Systems Using Self-Consistent Field Theory
Adam Hannon, Kevin Gotrik, Alfredo Alexander-Katz, Caroline Ross
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Monday, February 27, 2012
12:15PM - 12:27PM
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B45.00006: Sub-10 nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing
Jeong Gon Son, Jae-Byum Chang, Karl K. Berggren, Caroline A. Ross
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Monday, February 27, 2012
12:27PM - 12:39PM
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B45.00007: Raster solvent vapor annealing of block copolymer thin films
Jonathan Seppala, Ronald Lewis, Thomas Epps
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Monday, February 27, 2012
12:39PM - 12:51PM
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B45.00008: Confined drying of copolymer solutions
Daubersies Laure, Leng Jacques, Salmon Jean-Baptiste
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Monday, February 27, 2012
12:51PM - 1:03PM
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B45.00009: Rapid Self- Assembly and Perpendicular Alignment in lamellar PS-b-PEO System for Fabrication of Sub 20 nm Nanolithography Templates
Parvaneh Mokarian-Tabari, Timothy W. Collins, Ramsankar Senthamaraikannan, Justin D. Holmes, Michael A. Morris
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Monday, February 27, 2012
1:03PM - 1:15PM
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B45.00010: Controlled Deposition of Ordered Block Copolymer Thin Films by Electrospray
Hanqiong Hu, Sofia Rangou, Apostolos Avergopoulos, Chinedum Osuji
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Monday, February 27, 2012
1:15PM - 1:27PM
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B45.00011: Two distinct timescales in the ordering of symmetric diblock copolymer films
Robert D. Peters, Kari Dalnoki-Veress
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Monday, February 27, 2012
1:27PM - 1:39PM
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B45.00012: The hydration and ordering of lamellar block copolymer films prior to the formation of polymer vesicles
Yohei Kamata, Andrew Parnell, Andrew Dennison, Robert Barker, Philipp Gutfreund, Maximilian Skoda, Shaomin Mai, Richard Jones
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Monday, February 27, 2012
1:39PM - 1:51PM
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B45.00013: Effect of thickness on microdomain orientation in shear-aligned, cylinder-forming PS-PHMA thin films
Raleigh Davis, Paul Chaikin, Richard Register
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Monday, February 27, 2012
1:51PM - 2:03PM
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B45.00014: GISAXS simulation and analysis on GPU clusters
Slim Chourou, Abhinav Sarje, Xiaoye Li, Elaine Chan, Alexander Hexemer
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Monday, February 27, 2012
2:03PM - 2:15PM
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B45.00015: Modeling Line Edge Roughness in Lamellar Block Copolymer Systems
Paul Patrone, Gregg Gallatin
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