Bulletin of the American Physical Society
APS March Meeting 2011
Volume 56, Number 1
Monday–Friday, March 21–25, 2011; Dallas, Texas
Session Q44: Focus Session: Dynamics of Polymers-Phenomena due to Confinement
11:15 AM–2:15 PM,
Wednesday, March 23, 2011
Room: A309
Sponsoring
Unit:
DPOLY
Chair: Rob Riggleman, University of California, Santa Barbara
Abstract ID: BAPS.2011.MAR.Q44.1
Abstract: Q44.00001 : The effect of pattern dimensions on the thermal decay of polymer patterns created by nanoimprint lithography
11:15 AM–11:27 AM
Preview Abstract Abstract
Authors:
Kenneth Kearns
(Saginaw Valley State University)
H.W. Ro
(National Institute of Standards and Technology)
Heather J. Patrick
(National Institute of Standards and Technology)
Thomas A. Germer
(National Institute of Standards and Technology)
Christopher Soles
(National Institute of Standards and Technology)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.MAR.Q44.1
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