Bulletin of the American Physical Society
APS March Meeting 2011
Volume 56, Number 1
Monday–Friday, March 21–25, 2011; Dallas, Texas
Session C1: Poster Session I (2:00pm - 5:00pm)
2:00 PM,
Monday, March 21, 2011
Room: Hall D
Sponsoring
Unit:
APS
Abstract ID: BAPS.2011.MAR.C1.74
Abstract: C1.00074 : Poly (2-vinyl naphthalene-b-acrylic acid) (P2VN-b-PAA) block copolymer pattern formation, alignment and pattern transfer by reactive ion etching (RIE)
Preview Abstract
Abstract
Authors:
Xin Zhang
(Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742)
Christopher Metting
(Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742)
R.M. Briber
(Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742)
Sang Hak Shin
(Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742)
Ben Jones
(Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.MAR.C1.74
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