Bulletin of the American Physical Society
2007 APS March Meeting
Volume 52, Number 1
Monday–Friday, March 5–9, 2007; Denver, Colorado
Session C1: Poster Session I
2:00 PM,
Monday, March 5, 2007
Colorado Convention Center
Room: Exhibit Hall F, 2:00pm - 5:00pm
Abstract ID: BAPS.2007.MAR.C1.46
Abstract: C1.00046 : Block copolymer lithography for growth of wide band gap nanostructures: Process control and optimization
Preview Abstract Abstract
Authors:
Kasiraman Krishnan
(GE Global Research)
Azar Alizadeh
(GE Global Research)
Oliver Boomhover
(GE Global Research)
Kenneth Conway
(GE Global Research)
Lauraine Denault
(GE Global Research)
David Hays
(GE Global Research)
Christopher Keimel
(GE Global Research)
Rosalyn Neander
(GE Global Research)
Seth Taylor
(GE Global Research)
Andreas Stintz
(University of New Mexico)
Jay Brown
(University of New Mexico)
Sanjay Krishna
(University of New Mexico)
Edit Braunstein
(Lockheed Martin)
Colin Jones
(Lockheed Martin)
Collaborations:
GE Global Research, University of New Mexico, Lockheed Martin
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2007.MAR.C1.46
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