Bulletin of the American Physical Society
2005 APS March Meeting
Monday–Friday, March 21–25, 2005; Los Angeles, CA
Session Y14: Focus Session: Supercritical Carbon Dioxide Processing
11:15 AM–1:39 PM,
Friday, March 25, 2005
LACC
Room: 403 B
Sponsoring
Unit:
FIAP
Chair: Shubhra Gangopadhyay, U of Missouri
Abstract ID: BAPS.2005.MAR.Y14.5
Abstract: Y14.00005 : Supercritical CO2 for Resist Development: Towards an All-Dry Lithography Process
12:51 PM–1:03 PM
Preview Abstract Abstract
Authors:
Nelson Felix
(School of Chemical and Biomolecular Engineering, Cornell University)
Yu (Jessie) Mao
(Department of Chemical Engineering, Massachusetts Institute of Technology)
Karen Gleason
(Department of Chemical Engineering, Massachusetts Institute of Technology)
Christopher Ober
(Department of Materials Science and Engineering, Cornell University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2005.MAR.Y14.5
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700