Bulletin of the American Physical Society
77th Annual Gaseous Electronics Conference
Monday–Friday, September 30–October 4 2024; San Diego, California
Session IT3: Gas-Phase Plasma Chemistry I
1:30 PM–3:30 PM,
Tuesday, October 1, 2024
Room: Great Room 5
Chair: Zoltan Donko, Wigner Research Center for Physics
Abstract: IT3.00001 : Methane coupling to C2Hx hydrocarbons by injection into the afterglow of a hydrogen plasma
1:30 PM–1:45 PM
Presenter:
Maria Luíza d Moreira de Azevedo
(Maastricht University)
Author:
Maria Luíza d Moreira de Azevedo
(Maastricht University)
Collaborations:
M. L. Azevedo, M. Arboleda Rodallega, M. Ruijzendaal, G. Van Rooij, T. Butterworth
To enter the residence time regime required for ethylene selectivity, we feed methane downstream of H2 plasma, mimicking the two-step Huels process in a microwave discharge. We use gas chromatography to investigate product distribution and methane conversion. We find increased ethane and ethylene yield at low pressures and powers, shifting towards acetylene at higher powers. Additionally, we use in-situ Raman scattering from H2 to measure rovibrational temperature at the mixing point and in the plasma. Gas temperatures were around ~700 – 800 K in the methane injection region for all conditions tested. Assuming negligible methane recirculation to the upstream plasma, we conclude that H-radical induced chemistry was the dominant reaction pathway. We will compare these results with ongoing experiments, in which thermal conversion is expected to increase with methane injected in hotter regions.
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