Bulletin of the American Physical Society
77th Annual Gaseous Electronics Conference
Monday–Friday, September 30–October 4 2024; San Diego, California
Session GR4: Green Plasma Technology I
1:30 PM–3:30 PM,
Thursday, October 3, 2024
Room: Great Room 6-8
Chair: Abbas Semnani, University of Toledo
Abstract: GR4.00001 : Organic Micropollutant Wastewater Treatment using a DBD Plasma and Flat 222 nm Far UV-C Excilamp
1:30 PM–1:45 PM
Presenter:
Kiran Ahlawat
(Indian Institute of Technology, Jodhpur)
Authors:
Kiran Ahlawat
(Indian Institute of Technology, Jodhpur)
Ramavtar Jangra
(Indian Institute of Technology Jodhpur)
Ram Prakash
(Indian Institute of Technology Jodhpur)
In this study, two organic micropollutants have been degraded by means of an environmentally friendly mercury-free far UV-C excimer light source along with an advanced oxidation process (AOP) using H2O2. For this purpose, a dielectric barrier discharge (DBD) plasma-based 222 nm wavelength excilamp has been designed and developed. The production of OH radicals in three different Advanced Oxidation Process (AOP) systems—LP-UV/H2O2, KrCl*/H2O2, and KrCl*/nitrate—was then compared. The results indicate that the UV/nitrate combination exhibited the highest level of steady-state OH concentration, followed by KrCl*/H2O2, and then LP-UV/H2O2. Additionally, we examined the differences in contaminant degradation for carbamazepine and sulfamethoxazole between KrCl* excimer lamps and low-pressure ultraviolet (LPUV) lamps. The findings show that, in comparison to LP-UV treatment, direct photolysis employing KrCl* excimer lamps significantly improves the degradation rate constants of carbamazepine and sulfamethoxazole. This improvement is likely due to a molar absorption coefficient that is more prominent at 222 nm rather than 254 nm. Compared to KrCl* excimer direct photolysis, KrCl*/AOP demonstrated improved degradation of carbamazepine; however, it did not increase the degradation of sulfamethoxazole. The analysis of this study will be presented.
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700