Bulletin of the American Physical Society
76th Annual Gaseous Electronics Conference
Volume 68, Number 9
Monday–Friday, October 9–13, 2023; Michigan League, Ann Arbor, Michigan
Session IW5: Poster Session II; Exhibition & Coffee (4:00pm-6:00pm)
4:00 PM,
Wednesday, October 11, 2023
Room: Michigan League, Ballroom
Abstract: IW5.00060 : Orientation dependent etching of silicon by F2*
Presenter:
Sierra Jubin
(Princeton Plasma Physics Laboratory)
Authors:
Yuri V Barsukov
(1Princeton Plasma Physics Laboratory)
Sierra Jubin
(Princeton Plasma Physics Laboratory)
Omesh D Dwivedi
(Princeton Plasma Physics Laboratory)
Joseph R Vella
(Princeton Plasma Physics Laboratory)
Igor Kaganovich
(1Princeton Plasma Physics Laboratory)
*The research described in this paper was conducted under the Laboratory Directed Research and Development (LDRD) Program at Princeton Plasma Physics Laboratory, a national laboratory operated by Princeton University for the U.S. Department of Energy under Prime Contract No. DE-AC02-09CH11466. The United States Government retains a non-exclusive, paid-up, irrevocable, world-wide license to publish or reproduce the published form of this manuscript, or allow others to do so, for United States Government purposes. In addition, this research used computing resources on the Princeton University Adroit Cluster and Stellar cluster.
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