Bulletin of the American Physical Society
76th Annual Gaseous Electronics Conference
Monday–Friday, October 9–13, 2023; Michigan League, Ann Arbor, Michigan
Session HT1: Magnetrons and Multipactors
8:00 AM–9:30 AM,
Tuesday, October 10, 2023
Room: Michigan League, Michigan
Chair: Peng Zhang, Michigan State University
Abstract: HT1.00001 : Design of rotational RF magnetron sputtering plasma and its characteristics for target utilization saving resources*
8:00 AM–8:30 AM
Presenter:
Yasunori Otsu
(Saga University, Japan)
Authors:
Yasunori Otsu
(Saga University, Japan)
Md. Amzad Hossain
(Jashore University of Science and Technology)
Julian Schulze
(Bochum University)
In this work, various RF rotational magnetron plasmas, of which some small-magnetron-plasmas are symmetrically arranged on the target disk, have been proposed to improve the target utilization under a center of gravity positioned at the yoke center. The maximum target utilization rate is attained to be higher than 80 %. A design for the RF rotational magnetron plasma is proposed as follows: (a) the small-magnetron-plasma form is selected not to be circular but to correspond to a race-track that widens the target utilization. (b) Various magnet arrangements are used to distribute some small-magnetron-plasmas at rotational symmetry. (c) The rectangular magnet for the small-magnetron-plasma is chosen with considering the diameter of the iron yoke mounted. (d) The magnetic field around the magnets is simulated by a 2D or 3D electromagnetic simulator. (e) The Hall parameter and Larmor radius of electrons are estimated to investigate the electron magnetic confinement in the small-magnetron-plasma. The ion saturation current and the target erosion depth in the proposed rotational RF magnetron plasma are measured to evaluate its characteristics by a Langmuir probe and surface analyzer, respectively.
[1]EP Patent : No.2553137B1, J. T. Gudmundsson, Plasma Sources Sci. Technol. 29 (2020)113001.
[2]T. Iseki, Vacuum, 80(2006)662.
*The work is financially supported by JSPS KAKENHI Grant Numbers JP22H01196. J. Schulze acknowledges support by the German Research Foundation in the frame of the project 'Plasmabasierte Prozessfuehrung von reaktiven Sputterprozessen' (No. 417888799).
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700