Bulletin of the American Physical Society

73rd Annual Gaseous Electronics Virtual Conference

Volume 65, Number 10

Monday–Friday, October 5–9, 2020; Time Zone: Central Daylight Time, USA.

Session Index

Session QW1: Plasma Deposition II

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Chair: Yogesh Vohra, University of Alabama at Birmingham

Wednesday, October 7, 2020 3:00PM - 3:30PM Live		QW1.00001: Plasma ALD strategies for area selective deposition Invited Speaker: Christophe Vallee Preview Abstract
Wednesday, October 7, 2020 3:30PM - 3:45PM Live		QW1.00002: Microwave Plasma Deposition of N-doped Diamond Films- Experiments \& Modelling Michael Bradley, Hammed Ejalonibu, Gordon Sarty Preview Abstract
Wednesday, October 7, 2020 3:45PM - 4:00PM Live		QW1.00003: Area Selective Plasma Enhanced Chemical Vapor Deposition of Silicon on Silicon Nitride and Aluminum Oxide. Ghewa Akiki, Daniel Suchet, Dmitri Daineka, Sergej Filonovich, Pavel Bulkin, Erik Johnson Preview Abstract
Wednesday, October 7, 2020 4:00PM - 4:15PM		QW1.00004: Plasma Ion Doping for Semiconductor Applications Hongwen Yan, Hiroyuki Miyazoe, Marinus Hopstaken, Sebastian Engelmann, Takashi Ando, Kevin Chan Preview Abstract

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Bulletin of the American Physical Society

73rd Annual Gaseous Electronics Virtual Conference

Volume 65, Number 10

Monday–Friday, October 5–9, 2020; Time Zone: Central Daylight Time, USA.

Session Index

Session QW1: Plasma Deposition II

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