72nd Annual Gaseous Electronics Conference
Volume 64, Number 10
Monday–Friday, October 28–November 1 2019;
College Station, Texas
Session Index
Session LW2: Plasma Materials II
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Chair: Pascal Chabert, École Polytechnique
Room: Century II
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Wednesday, October 30, 2019
1:45PM - 2:00PM
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LW2.00001: Advanced Manufacturing with Atmospheric Pressure Plasmas: Electrostatic Focusing of Printed Silicon Nanocrystals
Rebecca Anthony, Alexander Ho
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Wednesday, October 30, 2019
2:00PM - 2:15PM
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LW2.00002: Synthesis of few-layer graphene using microwave-exited atmospheric pressure plasma
Mineo Hiramatsu, Koki Miyashita, Taishu Oyama, Keigo Takeda, Hiroki Kondo, Masaru Hori
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Wednesday, October 30, 2019
2:15PM - 2:45PM
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LW2.00003: High-rate deposition of high-density amorphous carbon films using a high-pressure plasma chemical vapor deposition
Invited Speaker:
Kazunori Koga
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Wednesday, October 30, 2019
2:45PM - 3:00PM
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LW2.00004: Reactor Scale Modeling of Nanoparticle Growth in Low Temperature Plasmas
Jordyn Polito, Steven Lanham, Himashi Andaraarachchi, Zhaohan Li, Zichang Xiong, Uwe Kortshagen, Mark J. Kushner
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Wednesday, October 30, 2019
3:00PM - 3:15PM
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LW2.00005: Study of an optical emission in the laser ablation plume of boron-rich target
Shurik Yatom, Alexander Khrabryi, Igor Kaganovich, Yevgeny Raitses
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Wednesday, October 30, 2019
3:15PM - 3:30PM
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LW2.00006: Enhancement of piezoelectric properties of nanofibers and nanocomposite membranes through corona treatment
Mujibur Khan, Papia Sultana, Mohammadsadegh Saadatzi, Malik Tahiyat, Tanvir Farouk, Sourav Banerjee
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Wednesday, October 30, 2019
3:30PM - 3:45PM
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LW2.00007: The Influence of the Magnetic Field on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge
Jon T. Gudmundsson, Hamidreza Hajihoseini, Martin Cada, Zdenek Hubiccka, Selen Unaldi, Michael A. Raadu, Nils Brenning, Daniel Lundin
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