71st Annual Gaseous Electronics Conference
Volume 63, Number 10
Monday–Friday, November 5–9, 2018;
Portland, Oregon
Session Index
Session TF2: Emerging Plasma Technology
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Show Abstracts |
Chair: Irina Schweigert, The George Washington University
Room: Oregon Convention Center A105
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Friday, November 9, 2018
9:30AM - 9:45AM
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TF2.00001: Variable-Frequency Capacitively Coupled Discharge as Tunable Impedance Element for RF Systems
Andrey Khomenko, Sergey Macheret
Preview Abstract |
Friday, November 9, 2018
9:45AM - 10:00AM
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TF2.00002: Effects of in-situ irradiation of nitrogen-hydrogen plasma on flatness and composition of GaN surfaces before epitaxial growth by a radical-enhanced metalorganic chemical vapor deposition
Hiroki Kondo, Amalraj Frank Wilson, Dhasiyan Arun Kumar, Yi Lu, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, Masaru Hori
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Friday, November 9, 2018
10:00AM - 10:30AM
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TF2.00003: Atomic Layer Defect-free Etching and Deposition Processes for future sub-10-nm devices.
Invited Speaker:
Seiji Samukawa
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Friday, November 9, 2018
10:30AM - 11:00AM
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TF2.00004: Towards understanding of plasma-based synthesis of carbon nanomaterials.
Invited Speaker:
Yevgeny Raitses
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Friday, November 9, 2018
11:00AM - 11:15AM
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TF2.00005: Plasma-Enhanced Pulsed Laser Deposition of metal-oxide thin films
Erik Wagenaars, David Meehan, Sudha Rajendiran, Andrew Rossall
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Friday, November 9, 2018
11:15AM - 11:30AM
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TF2.00006: Particle in Cell Simulation of Plasma Assisted Carbon Nanotubes Formation
Sergey Averkin
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Friday, November 9, 2018
11:30AM - 11:45AM
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TF2.00007: Effect of strong electric field on plasma-enhanced catalytic growth of carbon nanofibers
Xuewei Zhang, Mikhail Shneider
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Friday, November 9, 2018
11:45AM - 12:00PM
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TF2.00008: Determination of BNNT growth precursors using thermodynamic analysis
Alexander Khrabry, Shurik Yatom, Igor Kaganovich, Vladislav Vekselman, Yevgeny Raitses
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Friday, November 9, 2018
12:00PM - 12:15PM
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TF2.00009: Plasma Processing for Graphene-Based Materials
Mineo Hiramatsu, Keigo Takeda, Hiroki Kondo, Masaru Hori
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