Bulletin of the American Physical Society

71st Annual Gaseous Electronics Conference

Volume 63, Number 10

Monday–Friday, November 5–9, 2018; Portland, Oregon

Session Index

Session NR2: Plasma Etching	Show Abstracts
Chair: Costel Biloiu, Applied Materials Room: Oregon Convention Center A105

Thursday, November 8, 2018 8:00AM - 8:15AM		NR2.00001: Optimization of Etching Recipe Using Deep Neural Network Yutaka Okuyama, Takeshi Ohmori, Hyakka Nakada, Masaru Kurihara Preview Abstract
Thursday, November 8, 2018 8:15AM - 8:30AM		NR2.00002: Optimization of Etching Recipe Using Reinforcement Learning Hyakka Nakada, Tatehito Usui, Takeshi Ohmori Preview Abstract
Thursday, November 8, 2018 8:30AM - 8:45AM		NR2.00003: Optimizing Plasma Etching of High Aspect Ratio Oxide-Nitride-Oxide Stacks Shuo Huang, Chad Huard, Sang Ki Nam, Seungbo Shim, Wonyup Ko, Mark J. Kushner Preview Abstract
Thursday, November 8, 2018 8:45AM - 9:00AM		NR2.00004: Etching of GeSe in an inductively coupled SF6 plasma Meyer Thibaut, Aurelie Girard, Christophe Cardinaud, Emeline Baudet, Petr Nemec, Virginie Nazabal Preview Abstract

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Bulletin of the American Physical Society

71st Annual Gaseous Electronics Conference

Volume 63, Number 10

Monday–Friday, November 5–9, 2018; Portland, Oregon

Session Index

Session NR2: Plasma Etching

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