Bulletin of the American Physical Society

71st Annual Gaseous Electronics Conference

Volume 63, Number 10

Monday–Friday, November 5–9, 2018; Portland, Oregon

Session Index

Session DT3: Plasma-Surface Interactions I (Etching)	Show Abstracts
Chair: Jane P. Chang, University of California, Los Angeles Room: Oregon Convention Center A106

Tuesday, November 6, 2018 8:00AM - 8:30AM		DT3.00001: Surface reaction control of plasma etch for atomic level accuracy in ULSI devices fabrication Invited Speaker: Masaru Izawa Preview Abstract
Tuesday, November 6, 2018 8:30AM - 8:45AM		DT3.00002: Dynamics of surface ripple formation and propagation during plasma etching Kouichi Ono Preview Abstract
Tuesday, November 6, 2018 8:45AM - 9:00AM		DT3.00003: Plasma Parameters in an Ar and Ar/Cl$_{\mathrm{2\thinspace }}$Asymmetric Coaxial CCP Used for Plasma Etching of Superconducting Niobium Cavities. Jeremy Peshl, Milka Nikolic, Alex Godunov, Svetozar Popovic, Lepsha Vuskovic Preview Abstract

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Bulletin of the American Physical Society

71st Annual Gaseous Electronics Conference

Volume 63, Number 10

Monday–Friday, November 5–9, 2018; Portland, Oregon

Session Index

Session DT3: Plasma-Surface Interactions I (Etching)

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