Bulletin of the American Physical Society
70th Annual Gaseous Electronics Conference
Volume 62, Number 10
Monday–Friday, November 6–10, 2017; Pittsburgh, Pennsylvania
Session BM2: Linking Theory & Experiment |
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Chair: Thomas Mussenbrock, Brandenburg University of Technology Room: Duquesne |
Monday, November 6, 2017 2:00PM - 2:30PM |
BM2.00001: Modeling of industrial plasma tools and applications: experimental validation Shahid Rauf, Samaneh Sadighi, Ajit Balakrishna, Kallol Bera, Jason Kenney, Wei Tian, Jun-Chieh Wang Plasmas are widely used for thin film processing during microelectronics fabrication. Modeling is an important tool for design of these plasma systems, and experimental validation of these models is important. Rapid pace of technology development makes such validation challenging in an industrial environment. Several examples are used to illustrate different methods for validating and refining models of industrial plasma systems. Ideally, systematic plasma diagnostic measurements should be made on the actual plasma tool as was the case in our multi-frequency capacitive plasma source. $n_{e}$ and $T_{e}$ were measured using double probes in the 2 -- 162 MHz range for several gases and pressures. If diagnostic data from the actual tool is not available, another option is to validate the models under similar conditions in a research reactor. For example, we are collaborating with Ecole Polytechnique on diagnostics in inductively coupled Cl$_{\mathrm{2}}$, Cl$_{\mathrm{2}}$/O$_{\mathrm{2}}$ and HBr plasmas. Final processing results (e.g., etch rate) are often the most easily available data. Validating plasma models using such data relies on coupling the plasma simulations to a surface chemistry mechanism. Surface chemistry introduces uncertainties, but often the model can be reasonably validated if the data covers a wide range of conditions. [Preview Abstract] |
Monday, November 6, 2017 2:30PM - 3:00PM |
BM2.00002: Validation of computation by Experiment for the VSim and USim Codes John Cary, SN Averkin, KRC Beckwith, BM Cowan, TG Jenkins, SE Kruger, M Kundrapu, C Roark, SW Sides, GR Werner The Tech-X codes, VSim and USim, have been used for modeling a wide range of plasma systems, including low-temperature plasma systems. VSim works on a structured cartesian or cylindrical mesh, has electrostatic and electromagnetic solvers, fluid models, and particle models. USim works on an unstructured hex mesh, has solvers for electromagnetics and fluids, and is particularly suited to studying high-Mach flows. VSim is more oriented towards low-density, weakly collisional systems, while USim is more oriented towards high-density, collisional systems. These codes have been tested on a number of standard problems in low temperature plasma, including the GEC Reference Cell and the Turner benchmarks, as well as being tested for solution accuracy for electromagnetics of structures. This talk will briefly describe the physics implementations in these codes, then show comparisons with experimental data. [Preview Abstract] |
Monday, November 6, 2017 3:00PM - 3:30PM |
BM2.00003: Combining advanced optical diagnostics and simulations to reveal chemical kinetics in atmospheric pressure plasmas Sandra Schroeter, J. Bredin, A. R. Gibson, A. West, A. Wijaikhum, K. Niemi, H. Davies, N. Minesi, J. Dedrick, M. Foucher, J. P. Booth, N. de Oliveira, D. Joyeux, L. Nahon, Y. Gorbanev, V. Chechik, E. Wagenaars, T. Gans, D. O'Connell Atmospheric pressure plasmas (APPs) are effective sources of reactive species (RS) and offer great potential for various applications, such as in biomedicine. Experimental quantification of RS is challenging in APPs due to their small dimensions and fast collisional de-excitation of excited states, requiring diagnostics with high temporal and spatial resolution. Plasma simulations give information about species densities and formation, but their accuracy depends on assumed reactions and rate coefficients, meaning that a benchmark against experimental measurements is desirable. Here, experimental and numerical approaches are combined to investigate RS production in rf APPs produced in a helium-water gas mixture. Absolute densities of O, H, OH, and H$_{\mathrm{2}}$O$_{\mathrm{2}}$ are measured using advanced optical diagnostics including VUV-VIS Absorption Spectroscopy in the liquid and gas phase, and picosecond Two-photon Absorption Laser-Induced Fluorescence, which are able to overcome the above-mentioned challenges. The successful benchmark of densities against a zero-dimensional plasma chemistry model allows for detailed investigation of formation pathways and identification of tailoring strategies based on varying gas composition and reactor design. [Preview Abstract] |
Monday, November 6, 2017 3:30PM - 4:00PM |
BM2.00004: Linking experimental measurements and numerical simulations to understand plasma-surface interaction processes A. R. Gibson, M. Blake, J. Bredin, K. Niemi, A. Greb, B. Bruneau, E. Johnson, A. Derzsi, Z. Donko, J.-P. Booth, D. O'Connell, T. Gans Surfaces play a key role in defining the properties of low-pressure plasma sources through the destruction of reactive neutral species. However, despite their importance, fundamental data concerning particle-surface interactions in plasmas are often poorly known as a result of difficulties in experimentally measuring surface interaction probabilities in active plasmas. Combining experiments and numerical simulations offers a promising route overcome the associated challenges and better understand surface interaction processes. In this work, phase resolved optical emission spectroscopy (PROES) and energy resolved acinometry (ERA) are used in combination with numerical simulations (one-dimensional PIC and fluid) to gain insight into surface losses of singlet delta oxygen metastables and atomic oxygen in low pressure radio-frequency driven capacitively coupled oxygen plasmas. [Preview Abstract] |
Monday, November 6, 2017 4:00PM - 4:30PM |
BM2.00005: The effects of elementary surface processes on the plasma parameters in capacitively coupled radiofrequency discharges Aranka Derzsi, Benedek Horvath, Manaswi Daksha, Birk Berger, Sebastian Wilczek, Jan Trieschmann, Thomas Mussenbrock, Peter Awakowicz, Zoltan Donko, Julian Schulze The elementary processes taking place at the boundary surfaces in capacitively coupled plasmas (CCPs) can largely influence the electron power absorption dynamics. Here, the effects of plasma particle-surface processes on the discharge characteristics are investigated by PIC/MCC simulations. Realistic description of the secondary electron emission (SEE) induced by heavy particles and electrons is implemented in the PIC/MCC model. Simulations are performed for a wide range of operating conditions in Argon by switching on/off the different elementary surface processes. In this way the effects of the individual processes on the plasma properties are separated. The results show that the secondary electron yield strongly depends on the discharge conditions and surface properties. At low pressures, the electron induced SEE is found to have an important role in the ionization dynamics. Therefore, we propose this process to be included in PIC/MCC simulations of CCPs in order to obtain more realistic results. [Preview Abstract] |
Monday, November 6, 2017 4:30PM - 5:00PM |
BM2.00006: Sputtering process data interpreted by heavy particle simulations Jan Trieschmann, Stefan Ries, Nikita Bibinov, Peter Awakowicz, Stanislav Mraz, Jochen M. Schneider, Thomas Mussenbrock The initial step toward a reliable prediction of plasma sputter deposition is a benchmark comparison of numerical models with experimental data. In addition to only a reconstruction, however, imperative insight can be gained from the internal state of the applied model. This reasoning is exemplified with an investigation of two sputtering discharges both operated at gas pressures below 1~Pa. Firstly, a large scale multi-frequency capacitively coupled plasma (MFCCP) is considered as characterized experimentally by spatially resolved plasma and deposition diagnostics. Using a kinetic simulation approach, the previously unexplained non-equilibrium transport kinetics is unraveled from calculated spatially resolved sputtered particle distribution functions. Secondly, for a direct current magnetron sputtering (dcMS) discharge experimentally determined sputtered particle density maps and deposition profiles are complemented with numerical simulation results. For different target materials and gas admixtures, the model reconstructs experimental density profiles and, moreover, predicts the inherent deposition efficiency. [Preview Abstract] |
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